Inventor

HUANG KUO-BIN

TW87 patents

⚠️ This page may combine multiple inventors who share the name “HUANG KUO-BIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HUANG KUO-BIN

TAIWAN SEMICONDUCTOR MFG CO LTD

Surface modification layer for conductive feature formation

Footing removal in cut-metal process

Self-protective layer formed on high-K dielectric layer

Semiconductor device and method

Metal gate structure and methods thereof

Self-protective layer formed on high-k dielectric layers with different materials

Self-protective layer formed on high-k dielectric layer

Wet etch chemistry for selective silicon etch

Gate stack structure and method for forming the same

Metal gate structure and methods thereof

Metal gate structure and methods thereof

Surface modification layer for conductive feature formation

Semiconductor device and method of manufacture

Wet cleaning with tunable metal recess for via plugs

Semiconductor device and method of manufacture using a contact etch stop layer (CESL) breakthrough process

Controlling fin-thinning through feedback

Method of breaking through etch stop layer

Wet etch chemistry for selective silicon etch

High-K metal gate and method for fabricating the same

Wet etching chemistry and method of forming semiconductor device using the same

Wet cleaning with tunable metal recess for via plugs

Fin field-effect transistor and method of forming the same

Surface modification layer for conductive feature formation

Controlling fin-thinning through feedback

Semiconductor device and method of manufacture

Semiconductor device and method of manufacture

Fin Field-Effect transistor and method of forming the same

Semiconductor device and method of manufacture

Surface modification layer for conductive feature formation

Controlling fin-thinning through feedback

Self-protective layer formed on high-K dielectric layer

Fin field-effect transistor and method of forming the same

Footing removal in cut-metal process

Semiconductor device and method of manufacture

Fin field-effect transistor and method of forming the same

Fin Field-Effect Transistor and method of forming the same

Chemical composition for tri-layer removal

Substrate vapor drying apparatus and method

Self-protective layer formed on high-k dielectric layers with different materials

Semiconductor device and method of manufacture

Semiconductor device and method of manufacture

Self-protective layer formed on high-k dielectric layer

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method for the same

Fin shape modification

Method of breaking through etch stop layer

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG

Method of patterning a metal gate of semiconductor device

Method for high temperature oxidations to prevent oxide edge peeling

HUANG KUO BIN

High temperature anneal for aluminum surface protection