Inventor
SAKAI MITSUHIRO
JP18 patents
Patents
18 patentsUS5815762ASep 29, 1998
Processing apparatus and processing method
TOKYO ELECTRON LTD104 citations97
US6159541ADec 12, 2000
Spin coating process
TOKYO ELECTRON LTD50 citations96
US6090205AJul 18, 2000
Apparatus for processing substrate
TOKYO ELECTRON LTD50 citations96
US6159288ADec 12, 2000
Method and apparatus for cleaning treatment
TOKYO ELECTRON LTD57 citations95
US5945161AAug 31, 1999
Apparatus and method for supplying process solution to surface of substrate to be processed
TOKYO ELECTRON LTD60 citations95
US6770149B2Aug 3, 2004
Method and apparatus for cleaning treatment
TOKYO ELECTRON LTD19 citations92
US6458208B1Oct 1, 2002
Film forming apparatus
TOKYO ELECTRON LTD40 citations92
US6447608B1Sep 10, 2002
Spin coating apparatus
TOKYO ELECTRON LTD43 citations92
US6443641B2Sep 3, 2002
Substrate process method and substrate process apparatus
TOKYO ELECTRON LTD28 citations92
US6261007B1Jul 17, 2001
Substrate process method and substrate process apparatus
TOKYO ELECTRON LTD43 citations92
US6238511B1May 29, 2001
Method and apparatus for processing substrate
TOKYO ELECTRON LTD34 citations92
US6168665B1Jan 2, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD46 citations92
US6165552ADec 26, 2000
Film forming method
TOKYO ELECTRON LTD41 citations92
US5853961ADec 29, 1998
Method of processing substrate and apparatus for processing substrate
TOKYO ELECTRON LTD29 citations92
US6062240AMay 16, 2000
Treatment device
TOKYO ELECTRON LTD45 citations91
US6203218B1Mar 20, 2001
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD17 citations84
US6391110B1May 21, 2002
Method and apparatus for cleaning treatment
TOKYO ELECTRON LTD15 citations83
US6398879B1Jun 4, 2002
Method and apparatus for cleaning treatment
TOKYO ELECTRON LTD10 citations73