Inventor
YAMAZAKI AKIYOSHI
JP20 patents
Patents
20 patentsUS5736296AApr 7, 1998
Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound
TOKYO OHKA KOGYO CO LTD46 citations96
US6340553B1Jan 22, 2002
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD26 citations92
US5955240ASep 21, 1999
Positive resist composition
TOKYO OHKA KOGYO CO LTD23 citations92
US5948589ASep 7, 1999
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD20 citations92
US5908730AJun 1, 1999
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD35 citations92
US5817444AOct 6, 1998
Positive-working photoresist composition and multilayered resist material using the same
TOKYO OHKA KOGYO CO LTD35 citations92
US5770343AJun 23, 1998
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD15 citations82
US6159652ADec 12, 2000
Positive resist composition
TOKYO OHKA KOGYO CO LTD12 citations73
US5945248AAug 31, 1999
Chemical-sensitization positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD14 citations73
US5874195AFeb 23, 1999
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD9 citations73
US6485887B2Nov 26, 2002
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD4 citations62
US5856058AJan 5, 1999
Chemical-sensitization positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US5854357ADec 29, 1998
Process for the production of polyhydroxstyrene
TOKYO OHKA KOGYO CO LTD3 citations62
US11261299B2Mar 1, 2022
Block copolymer and method of producing the same, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations49
US11780946B2Oct 10, 2023
Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations48
USRE38254ESep 16, 2003
Positive resist composition
TOKYO OHKA KOGYO CO LTD1 citations48
US11560444B2Jan 24, 2023
Method of producing block copolymer capable of creating specific structure pattern
TOKYO OHKA KOGYO CO LTD0 citations47
US10941253B2Mar 9, 2021
Block copolymer, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations46
US7741008B2Jun 22, 2010
Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method
TOKYO OHKA KOGYO CO LTD0 citations41
US7629105B2Dec 8, 2009
Positive photoresist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations39