Inventor

PARK PAN-KWI

KR27 patents

⚠️ This page may combine multiple inventors who share the name “PARK PAN-KWI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PARK PAN-KWI

SAMSUNG ELECTRONICS CO LTD

Semiconductor devices including a stressor in a recess and methods of forming the same

Method of manufacturing semiconductor devices

Semiconductor device having embedded strain-inducing pattern and method of forming the same

Semiconductor device having embedded strain-inducing pattern and method of forming the same

Semiconductor device having embedded strain-inducing pattern and method of forming the same

Field effect transistor with stacked nanowire-like channels and methods of manufacturing the same

Semiconductor devices

Semiconductor devices

Semiconductor device having multi-bridge channel field-effect transistor including source/drain pattern with a plurality of semiconductor patterns

Semiconductor device

Semiconductor device

Semiconductor device

Semiconductor devices including a stressor in a recess and methods of forming the same

Methods of manufacturing semiconductor devices

Multi gate semiconductor device

Semiconductor devices

Semiconductor device having embedded strain-inducing pattern and method of forming the same

Semiconductor device having insulating pattern and method of forming the same

Semiconductor process chamber including lower volume upper dome

Precleaning apparatus and substrate processing system

SHIN DONG-SUK

Semiconductor devices including a stressor in a recess and methods of forming the same

Semiconductor devices including a stressor in a recess and methods of forming the same

LIM HA-JIN

Etch stop layers and methods of forming the same

Method of fabricating semiconductor integrated circuit device

PARK PAN-KWI

Methods of manufacturing semiconductor devices

Method of forming semiconductor device using Si-H rich silicon nitride layer

YU HYUN-KWAN

Method of manufacturing semiconductor device