Inventor

LIAN LEI

US51 patents

⚠️ This page may combine multiple inventors who share the name “LIAN LEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIAN LEI

APPLIED MATERIALS INC

Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring

Interferometric endpoint determination in a substrate etching process

Interferometric endpoint determination in a substrate etching process

Method and apparatus for performing limited area spectral analysis

In-situ optical chamber surface and process sensor

3D NAND staircase CD control by using interferometric endpoint detection

Advanced process sensing and control using near infrared spectral reflectometry

Method and apparatus for performing limited area spectral analysis

Determining endpoint in a substrate process

Eliminating internal reflections in an interferometric endpoint detection system

Autonomous substrate processing system

Autonomous substrate processing system

3D NAND staircase CD control by using interferometric endpoint detection

Optical cable for interferometric endpoint detection

Endpoint detection system for enhanced spectral data collection

Endpoint detection system for enhanced spectral data collection

In-situ optical chamber surface and process sensor

Embedded test structure for trimming process control

Determining endpoint in a substrate process

Method for controlling a process for fabricating integrated devices

Method and apparatus for performing limited area spectral analysis

Adjustable achromatic collimator assembly for endpoint detection systems

Adjustable achromatic collimator assembly for endpoint detection systems

Method for automatic determination of substrates states in plasma processing chambers

Etalon thermometry for plasma environments

Endpoint detection in low open area and/or high aspect ratio etch applications

Etch feedback for control of upstream process

QINGDAO KINGAGROOT CHEMICAL COMPOUND CO LTD

Pyridyloxy-carboxylate derivative and preparation method therefor, herbicidal composition, and use

Mutant p-hydroxyphenylpyruvate dioxygenase, and coding nucleic acid and use thereof

Pyridyloxy carboxylate derivative, preparation method therefor, herbicidal composition and use thereof

Pyridyloxy thioester derivative and preparation method therefor, herbicidal composition, and application

R-type pyridyloxycarboxylic acid, salt and ester derivative thereof, and preparation method therefor, and herbicidal composition and application thereof

Pyridazinol compounds and derivatives, preparation methods, herbicidal compositions and applications thereof

Substituted-isoxazoline-containing aromatic compound, preparation method therefor, herbicidal composition and use thereof

4-pyridinyl formamide compound or derivative thereof, preparation method therefor, herbicidal composition and use thereof

Substituted thiadiazinone dioxide and preparation method therefor, herbicidal composition, and application therefor

Fused ring substituted aromatic compound and preparation method therefor, herbicidal composition, and use thereof

Pyridazinol compound, derivative thereof, preparation method therefor, herbicidal composition and use thereof

Substituted 1,2,4-triazolo[4,3-a]pyridine derivative and preparation method, herbicidal composition and application thereof

Pyridine ring-substituted pyridazinol compounds and derivatives, preparation methods, herbicidal compositions and applications thereof

Five-membered ring-substituted pyridazinol compounds and derivatives, preparation methods, herbicidal compositions and applications thereof

QINGDAO KINGAGROOT CHEMICAL COMPOUNDS CO LTD

Pyrazole compounds or salts thereof, preparation method therefor, herbicidal composition and use thereof

Pyrazolone compound or salt thereof, preparation method therefor, herbicide composition and use thereof

Pyrazole compounds or salts thereof, preparation methods therefor, herbicidal compositions and use thereof

LIAN LEI

Pulsed plasma monitoring using optical sensor and a signal analyzer forming a mean waveform

Determining endpoint in a substrate process

DAVIS MATTHEW F

Within-sequence metrology based process tuning for adaptive self-aligned double patterning

Method and apparatus for in-situ metrology of a workpiece disposed in a vacuum processing chamber

DAVIS MATTHEW FENTON

Method and system for monitoring an etch process

APPLIED MATERILS INC

Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring