Inventor
HIROSE KEIZO
JP19 patents
⚠️ This page may combine multiple inventors who share the name “HIROSE KEIZO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS6544380B2Apr 8, 2003
Plasma treatment method and apparatus
TOKYO ELECTRON LTD104 citations98
US6074518AJun 13, 2000
Plasma processing apparatus
TOKYO ELECTRON LTD276 citations98
US5919332AJul 6, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD445 citations98
US5698062ADec 16, 1997
Plasma treatment apparatus and method
TOKYO ELECTRON LTD161 citations98
US6165270ADec 26, 2000
Process solution supplying apparatus
TOKYO ELECTRON LTD41 citations96
US6106737AAug 22, 2000
Plasma treatment method utilizing an amplitude-modulated high frequency power
TOKYO ELECTRON LTD66 citations96
US6012858AJan 11, 2000
Apparatus and method for forming liquid film
TOKYO ELECTRON LTD82 citations96
US7537672B1May 26, 2009
Apparatus for plasma processing
TOKYO ELECTRON LTD44 citations92
US7364626B2Apr 29, 2008
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD26 citations92
US6432212B1Aug 13, 2002
Substrate washing method
TOKYO ELECTRON LTD35 citations92
US6391147B2May 21, 2002
Plasma treatment method and apparatus
TOKYO ELECTRON LTD49 citations92
US6385805B2May 14, 2002
Scrubbing apparatus
TOKYO ELECTRON LTD55 citations92
US6300043B1Oct 9, 2001
Method of forming resist film
TOKYO ELECTRON LTD20 citations92
US6175983B1Jan 23, 2001
Substrate washing apparatus and method
TOKYO ELECTRON LTD34 citations92
US6554010B1Apr 29, 2003
Substrate cleaning tool, having permeable cleaning head
TOKYO ELECTRON LTD23 citations90
US6431258B1Aug 13, 2002
Process solution supplying apparatus
TOKYO ELECTRON LTD8 citations74
US9960069B2May 1, 2018
Joining device and joining system
TOKYO ELECTRON LTD2 citations71
US7010826B2Mar 14, 2006
Substrate cleaning tool and substrate cleaning apparatus
TOKYO ELECTRON LTD2 citations63