Inventor
KIM SEONG-HYUCK
KR3 patents
Patents
3 patentsUS7070891B2Jul 4, 2006
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
SAMSUNG ELECTRONICS CO LTD2 citations58
US7341809B2Mar 11, 2008
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
SAMSUNG ELECTRONICS CO LTD0 citations47
US6919149B2Jul 19, 2005
Wave guided alternating phase shift mask and fabrication method thereof
SAMSUNG ELECTRONICS CO LTD1 citations47