Inventor
TAYLOR THEODORE M
US41 patents
⚠️ This page may combine multiple inventors who share the name “TAYLOR THEODORE M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
38 patentsUS6703272B2Mar 9, 2004
Methods of forming spaced conductive regions, and methods of forming capacitor constructions
MICRON TECHNOLOGY INC19 citations93
US6962520B2Nov 8, 2005
Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces
MICRON TECHNOLOGY INC16 citations92
US6939211B2Sep 6, 2005
Planarizing solutions including abrasive elements, and methods for manufacturing and using such planarizing solutions
MICRON TECHNOLOGY INC26 citations92
US6869335B2Mar 22, 2005
Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces
MICRON TECHNOLOGY INC25 citations92
US6666749B2Dec 23, 2003
Apparatus and method for enhanced processing of microelectronic workpieces
MICRON TECHNOLOGY INC51 citations92
US7169014B2Jan 30, 2007
Apparatuses for controlling the temperature of polishing pads used in planarizing micro-device workpieces
MICRON TECHNOLOGY INC20 citations86
US7967661B2Jun 28, 2011
Systems and pads for planarizing microelectronic workpieces and associated methods of use and manufacture
MICRON TECHNOLOGY INC9 citations82
US7377018B2May 27, 2008
Method of replacing a subpad of a polishing apparatus
MICRON TECHNOLOGY INC8 citations74
US7361078B2Apr 22, 2008
Subpad support with releasable subpad securing element and polishing apparatus
MICRON TECHNOLOGY INC4 citations74
US7210984B2May 1, 2007
Shaped polishing pads for beveling microfeature workpiece edges, and associated systems and methods
MICRON TECHNOLOGY INC8 citations74
US7134944B2Nov 14, 2006
Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
MICRON TECHNOLOGY INC5 citations74
US7131889B1Nov 7, 2006
Method for planarizing microelectronic workpieces
MICRON TECHNOLOGY INC7 citations74
US7094695B2Aug 22, 2006
Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization
MICRON TECHNOLOGY INC8 citations74
US7077733B1Jul 18, 2006
Subpad support with a releasable subpad securing element and polishing apparatus including the subpad support
MICRON TECHNOLOGY INC7 citations74
US7066792B2Jun 27, 2006
Shaped polishing pads for beveling microfeature workpiece edges, and associate system and methods
MICRON TECHNOLOGY INC8 citations74
US6969306B2Nov 29, 2005
Apparatus for planarizing microelectronic workpieces
MICRON TECHNOLOGY INC5 citations74
US6884144B2Apr 26, 2005
Methods and systems for planarizing microelectronic devices with Ge-Se-Ag layers
MICRON TECHNOLOGY INC11 citations74
US6866566B2Mar 15, 2005
Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
MICRON TECHNOLOGY INC10 citations74
US6781189B2Aug 24, 2004
Floating gate transistor with STI
MICRON TECHNOLOGY INC11 citations74
US7591061B2Sep 22, 2009
Method for securing a subpad to a subpad support
MICRON TECHNOLOGY INC2 citations63
US7381647B2Jun 3, 2008
Methods and systems for planarizing microelectronic devices with Ge-Se-Ag layers
MICRON TECHNOLOGY INC2 citations63
US7163447B2Jan 16, 2007
Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
MICRON TECHNOLOGY INC1 citations63
US7121921B2Oct 17, 2006
Methods for planarizing microelectronic workpieces
MICRON TECHNOLOGY INC3 citations63
US7040965B2May 9, 2006
Methods for removing doped silicon material from microfeature workpieces
MICRON TECHNOLOGY INC3 citations63
US6861309B2Mar 1, 2005
Methods of forming spaced conductive regions, and methods of forming capacitor constructions
MICRON TECHNOLOGY INC1 citations63
US6812095B2Nov 2, 2004
Methods of forming floating gate transistors using STI
MICRON TECHNOLOGY INC2 citations63
US9614153B2Apr 4, 2017
Methods of selectively doping chalcogenide materials and methods of forming semiconductor devices
MICRON TECHNOLOGY INC0 citations52
US8043944B2Oct 25, 2011
Process for enhancing solubility and reaction rates in supercritical fluids
MICRON TECHNOLOGY INC0 citations52
US7598181B2Oct 6, 2009
Process for enhancing solubility and reaction rates in supercritical fluids
MICRON TECHNOLOGY INC0 citations52
US7276765B2Oct 2, 2007
Buried transistors for silicon on insulator technology
MICRON TECHNOLOGY INC0 citations52
US7223297B2May 29, 2007
Planarizing solutions including abrasive elements, and methods for manufacturing and using such planarizing solutions
MICRON TECHNOLOGY INC0 citations52
US7210985B2May 1, 2007
Shaped polishing pads for beveling microfeature workpiece edges, and associated systems and methods
MICRON TECHNOLOGY INC0 citations52
US7208368B2Apr 24, 2007
Methods of forming spaced conductive regions, and methods of forming capacitor constructions
MICRON TECHNOLOGY INC0 citations52
US7189153B2Mar 13, 2007
Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces
MICRON TECHNOLOGY INC0 citations52
US7122420B2Oct 17, 2006
Methods of recessing conductive material and methods of forming capacitor constructions
MICRON TECHNOLOGY INC0 citations52
US7021996B2Apr 4, 2006
Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
MICRON TECHNOLOGY INC0 citations52
US7001254B2Feb 21, 2006
Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
MICRON TECHNOLOGY INC0 citations52
US6900500B2May 31, 2005
Buried transistors for silicon on insulator technology
MICRON TECHNOLOGY INC1 citations52