Inventor
HATAKEYAMA JUN
JP574 patents
⚠️ This page may combine multiple inventors who share the name “HATAKEYAMA JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
43 patentsUS7537880B2May 26, 2009
Polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO258 citations99
US6448420B1Sep 10, 2002
Acid-decomposable ester compound suitable for use in resist material
SHINETSU CHEMICAL CO160 citations99
US6312867B1Nov 6, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO209 citations99
US6280898B1Aug 28, 2001
Lactone-containing compounds, polymers, resist compositions, and patterning method
SHINETSU CHEMICAL CO229 citations99
US9091918B2Jul 28, 2015
Sulfonium salt, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO58 citations98
US7670750B2Mar 2, 2010
Polymer, resist protective coating material, and patterning process
SHINETSU CHEMICAL CO65 citations98
US7598016B2Oct 6, 2009
Resist composition and patterning process
SHINETSU CHEMICAL CO107 citations98
US7569326B2Aug 4, 2009
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO129 citations98
US7455952B2Nov 25, 2008
Patterning process and resist overcoat material
SHINETSU CHEMICAL CO63 citations98
US7358025B2Apr 15, 2008
Photoresist undercoat-forming material and patterning process
SHINETSU CHEMICAL CO55 citations98
US7303855B2Dec 4, 2007
Photoresist undercoat-forming material and patterning process
SHINETSU CHEMICAL CO85 citations98
US7084303B2Aug 1, 2006
Tertiary amine compounds having an ester structure and processes for preparing same
SHINETSU CHEMICAL CO79 citations98
US5972560AOct 26, 1999
High molecular weight silicone compound, chemically amplified positive resist composition and patterning method
SHINETSU CHEMICAL CO94 citations98
US7771914B2Aug 10, 2010
Resist composition and patterning process
SHINETSU CHEMICAL CO90 citations97
US7354693B2Apr 8, 2008
Polymer, resist protective coating material, and patterning process
SHINETSU CHEMICAL CO54 citations96
US6673511B1Jan 6, 2004
Resist composition
SHINETSU CHEMICAL CO48 citations96
US6309796B1Oct 30, 2001
High molecular weight silicone compounds resist compositions, and patterning method
SHINETSU CHEMICAL CO63 citations96
US6147249ANov 14, 2000
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO81 citations96
US6048661AApr 11, 2000
Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation
SHINETSU CHEMICAL CO80 citations96
US10295904B2May 21, 2019
Resist composition and patterning process
SHINETSU CHEMICAL CO43 citations94
US9250518B2Feb 2, 2016
Resist composition and patterning process
SHINETSU CHEMICAL CO35 citations94
US7771913B2Aug 10, 2010
Resist composition and patterning process using the same
SHINETSU CHEMICAL CO55 citations94
US8048610B2Nov 1, 2011
Sulfonium salt-containing polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO32 citations93
US8003295B2Aug 23, 2011
Patterning process and resist composition used therein
SHINETSU CHEMICAL CO25 citations93
US7759047B2Jul 20, 2010
Resist protective film composition and patterning process
SHINETSU CHEMICAL CO33 citations93
US7642034B2Jan 5, 2010
Polymer, resist protective coating material, and patterning process
SHINETSU CHEMICAL CO22 citations93
US7622242B2Nov 24, 2009
Resist composition and patterning process
SHINETSU CHEMICAL CO25 citations93
US7514202B2Apr 7, 2009
Thermal acid generator, resist undercoat material and patterning process
SHINETSU CHEMICAL CO37 citations93
US7510820B2Mar 31, 2009
Resist undercoat-forming material and patterning process
SHINETSU CHEMICAL CO24 citations93
US7459261B2Dec 2, 2008
Resist composition and patterning process using the same
SHINETSU CHEMICAL CO28 citations93
US7214743B2May 8, 2007
Resist lower layer film material and method for forming a pattern
SHINETSU CHEMICAL CO29 citations93
US7163778B2Jan 16, 2007
Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
SHINETSU CHEMICAL CO28 citations93
US6994946B2Feb 7, 2006
Silicon-containing polymer, resist composition and patterning process
SHINETSU CHEMICAL CO32 citations93
US6919161B2Jul 19, 2005
Silicon-containing polymer, resist composition and patterning process
SHINETSU CHEMICAL CO32 citations93
US6916593B2Jul 12, 2005
Resist composition
SHINETSU CHEMICAL CO33 citations93
US6902772B2Jun 7, 2005
Silicon-containing polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6878501B2Apr 12, 2005
Polymer, chemically amplified resist composition and patterning process
SHINETSU CHEMICAL CO31 citations93
US6875556B2Apr 5, 2005
Resist compositions and patterning process
SHINETSU CHEMICAL CO20 citations93
US6869744B2Mar 22, 2005
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO31 citations93
US6749988B2Jun 15, 2004
Amine compounds, resist compositions and patterning process
SHINETSU CHEMICAL CO43 citations93
US6746817B2Jun 8, 2004
Resist composition and patterning process
SHINETSU CHEMICAL CO49 citations93
US6743564B2Jun 1, 2004
Amine compounds, resist compositions and patterning process
SHINETSU CHEMICAL CO22 citations93
US6730453B2May 4, 2004
High molecular weight silicone compounds, resist compositions, and patterning method
SHINETSU CHEMICAL CO42 citations93
OHASHI MASAKI
2 patentsUS8105748B2Jan 31, 2012
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI81 citations98
US8057985B2Nov 15, 2011
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
OHASHI MASAKI52 citations94
HATAKEYAMA JUN
2 patentsSHIN ESTU CHEMICAL CO LTD
1 patentCENTRAL GLASS CO LTD
1 patentCALSONIC KANSEI CORP
1 patentShowing the top 50 of 574 patents by PatentIndex Score.