Inventor
AKAGAWA HIROYUKI
JP7 patents
⚠️ This page may combine multiple inventors who share the name “AKAGAWA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
6 patentsUS7592104B2Sep 22, 2009
Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
HOYA CORP10 citations82
US7579120B2Aug 25, 2009
Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank
HOYA CORP9 citations81
US7892708B2Feb 22, 2011
Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
HOYA CORP1 citations61
US7745074B2Jun 29, 2010
Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
HOYA CORP1 citations61
US7998644B2Aug 16, 2011
Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
HOYA CORP1 citations60
US7700244B2Apr 20, 2010
Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
HOYA CORP1 citations60