Inventor
CHONG HALBERT
US8 patents
Patents
8 patentsUS11289312B2Mar 29, 2022
Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability
APPLIED MATERIALS INC4 citations71
US11473189B2Oct 18, 2022
Method for particle removal from wafers through plasma modification in pulsed PVD
APPLIED MATERIALS INC2 citations70
US12338527B2Jun 24, 2025
Shutter disk for physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC0 citations61
US11249390B2Feb 15, 2022
Extreme ultraviolet mask absorber materials
APPLIED MATERIALS INC0 citations61
US11898236B2Feb 13, 2024
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC1 citations60
US11932934B2Mar 19, 2024
Method for particle removal from wafers through plasma modification in pulsed PVD
APPLIED MATERIALS INC0 citations59
US11251024B2Feb 15, 2022
Coating for chamber particle reduction
APPLIED MATERIALS INC0 citations55
US11661652B2May 30, 2023
Wet cleaning inside of gasline of semiconductor process equipment
APPLIED MATERIALS INC0 citations47