Inventor
BABAYAN VIACHSLAV
US20 patents
Patents
20 patentsUS9865484B1Jan 9, 2018
Selective etch using material modification and RF pulsing
APPLIED MATERIALS INC109 citations97
US10203604B2Feb 12, 2019
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC16 citations94
US9964863B1May 8, 2018
Post exposure processing apparatus
APPLIED MATERIALS INC22 citations94
US10474033B2Nov 12, 2019
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC4 citations84
US9958782B2May 1, 2018
Apparatus for post exposure bake
APPLIED MATERIALS INC9 citations84
US9829790B2Nov 28, 2017
Immersion field guided exposure and post-exposure bake process
APPLIED MATERIALS INC12 citations84
US11550224B2Jan 10, 2023
Apparatus for post exposure bake
APPLIED MATERIALS INC2 citations73
US11262662B2Mar 1, 2022
Post exposure processing apparatus
APPLIED MATERIALS INC2 citations73
US11112697B2Sep 7, 2021
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC3 citations73
US10401742B2Sep 3, 2019
Post exposure processing apparatus
APPLIED MATERIALS INC1 citations73
US11094573B2Aug 17, 2021
Method and apparatus for thin wafer carrier
APPLIED MATERIALS INC3 citations72
US10615058B2Apr 7, 2020
Apparatus for field guided acid profile control in a photoresist layer
APPLIED MATERIALS INC3 citations72
US11049701B2Jun 29, 2021
Biased cover ring for a substrate processing system
APPLIED MATERIALS INC3 citations70
US12057329B2Aug 6, 2024
Selective etch using material modification and RF pulsing
APPLIED MATERIALS INC0 citations62
US11899366B2Feb 13, 2024
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC0 citations62
US10954594B2Mar 23, 2021
High temperature vapor delivery system and method
APPLIED MATERIALS INC0 citations62
US10845715B2Nov 24, 2020
Post exposure processing apparatus
APPLIED MATERIALS INC0 citations52
US10754252B2Aug 25, 2020
Apparatus for post exposure bake
APPLIED MATERIALS INC0 citations52
US10566177B2Feb 18, 2020
Pulse shape controller for sputter sources
APPLIED MATERIALS INC0 citations41
US10858727B2Dec 8, 2020
High density, low stress amorphous carbon film, and process and equipment for its deposition
APPLIED MATERIALS INC0 citations40