Inventor
CHEN BWO-NING
TW20 patents
⚠️ This page may combine multiple inventors who share the name “CHEN BWO-NING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
19 patentsUS11139432B1Oct 5, 2021
Methods of forming a FinFET device
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations85
US11916105B2Feb 27, 2024
Semiconductor device with corner isolation protection and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations74
US12349432B2Jul 1, 2025
Enlarged backside contact
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12317550B2May 27, 2025
Methods of forming a semiconductor device with corner isolation protection
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12315738B2May 27, 2025
Method of forming a gate structure including semiconductor material implantation into dummy gate stack
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12113118B2Oct 8, 2024
Stress-inducing silicon liner in semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12027425B2Jul 2, 2024
Method of forming a gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11991936B2May 21, 2024
Method of forming a FinFET device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11935954B2Mar 19, 2024
Semiconductor device structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11728405B2Aug 15, 2023
Stress-inducing silicon liner in semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11594680B2Feb 28, 2023
Method of forming a FinFET device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11482610B2Oct 25, 2022
Method of forming a gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11133386B2Sep 28, 2021
Multi-layer fin structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12356660B2Jul 8, 2025
Multi-gate device and related methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11949016B2Apr 2, 2024
Multi-gate device and related methods
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations60
US11688647B2Jun 27, 2023
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11081401B2Aug 3, 2021
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations60
US12575134B2Mar 10, 2026
Multi-gate devices with reduced contact resistance and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
USRE47562EAug 6, 2019
Strained-channel semiconductor device fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47