Inventor

KUDO TAKANORI

JP32 patents

⚠️ This page may combine multiple inventors who share the name “KUDO TAKANORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KUDO TAKANORI

HITACHI LTD

Magnetic recording medium having a lubricant layer comprising ionically interbonded fluoropolyethers with acidic and basic terminal groups

Coal gasification furnace with a slag tap hole of specific shape

Process for producing magnetic recording medium, magnetic paint, and magnetic disk

Magnetic recording medium comprising a surface treatment layer provided on the magnetic layer of specified fluorocarboxylic acid amine salts

Magnetic recording medium

Entrained bed coal gasification reactor and method of gasifying coal

Process for producing information recording medium

Magnetic recording medium

HOECHST JAPAN

Radiation-sensitive mixture comprising a basic iodonium compound

Pattern forming material including photoacid and photobase generators for large exposure latitude

Positive-working radiation-sensitive mixture

Radiation sensitive composition

Photosensitive resin composition for color filter production

Positive-working radiation-sensitive mixture

Colored, photosensitive resin composition

CLARIANT FINANCE BVI LTD

Photoresist composition for deep UV radiation containing an additive

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

Process for producing film forming resins for photoresist compositions

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

Negative deep ultraviolet photoresist

Photosensitive resin composition

AZ ELECTRONIC MATERIALS USA

Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds

Composition for coating over a photoresist pattern

Photoresist compositions

Photoactive compounds

MERCK PATENT GMBH

Novolak/DNQ based, chemically amplified photoresist

PAG-free positive chemically amplified resist composition and methods of using the same

AZ ELECTRONIC MATERIALS LUXEMBOURG SARL

Antireflective coating compositions and processes thereof

KUDO TAKANORI

Bottom antireflective coating compositions and processes thereof

MAEKAWA SEISAKUSHO KK

Inter-region thermal complementary system by distributed cryogenic and thermal devices

RAHMAN M DALIL

Antireflective coating composition and process thereof

CHAKRAPANI SRINIVASAN

Photoresist compositions