Inventor
NGO MINH V
US26 patents
⚠️ This page may combine multiple inventors who share the name “NGO MINH V”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
19 patentsUS6787864B2Sep 7, 2004
Mosfets incorporating nickel germanosilicided gate and methods for their formation
ADVANCED MICRO DEVICES INC126 citations98
US6562718B1May 13, 2003
Process for forming fully silicided gates
ADVANCED MICRO DEVICES INC107 citations98
US7001837B2Feb 21, 2006
Semiconductor with tensile strained substrate and method of making the same
ADVANCED MICRO DEVICES INC18 citations93
US6924182B1Aug 2, 2005
Strained silicon MOSFET having reduced leakage and method of its formation
ADVANCED MICRO DEVICES INC26 citations93
US6878592B1Apr 12, 2005
Selective epitaxy to improve silicidation
ADVANCED MICRO DEVICES INC51 citations93
US6797614B1Sep 28, 2004
Nickel alloy for SMOS process silicidation
ADVANCED MICRO DEVICES INC24 citations93
US6730576B1May 4, 2004
Method of forming a thick strained silicon layer and semiconductor structures incorporating a thick strained silicon layer
ADVANCED MICRO DEVICES INC28 citations93
US7015504B2Mar 21, 2006
Sidewall formation for high density polymer memory element array
ADVANCED MICRO DEVICES INC22 citations92
US6774432B1Aug 10, 2004
UV-blocking layer for reducing UV-induced charging of SONOS dual-bit flash memory devices in BEOL
ADVANCED MICRO DEVICES INC31 citations92
US6765254B1Jul 20, 2004
Structure and method for preventing UV radiation damage and increasing data retention in memory cells
ADVANCED MICRO DEVICES INC30 citations92
US6858503B1Feb 22, 2005
Depletion to avoid cross contamination
ADVANCED MICRO DEVICES INC10 citations74
US6806165B1Oct 19, 2004
Isolation trench fill process
ADVANCED MICRO DEVICES INC9 citations74
US5888911AMar 30, 1999
HSQ processing for reduced dielectric constant
ADVANCED MICRO DEVICES INC11 citations74
US7018896B2Mar 28, 2006
UV-blocking layer for reducing UV-induced charging of SONOS dual-bit flash memory devices in BEOL processing
ADVANCED MICRO DEVICES INC9 citations73
US5888898AMar 30, 1999
HSQ baking for reduced dielectric constant
ADVANCED MICRO DEVICES INC8 citations72
US7701019B2Apr 20, 2010
Tensile strained substrate
ADVANCED MICRO DEVICES INC2 citations63
US6893929B1May 17, 2005
Method of forming strained silicon MOSFET having improved threshold voltage under the gate ends
ADVANCED MICRO DEVICES INC6 citations63
US6982188B1Jan 3, 2006
Post CMP precursor treatment
ADVANCED MICRO DEVICES INC6 citations62
US6951220B1Oct 4, 2005
Method of decontaminating equipment
ADVANCED MICRO DEVICES INC3 citations61
SPANSION LLC
3 patentsUS6894342B1May 17, 2005
Structure and method for preventing UV radiation damage in a memory cell and improving contact CD control
SPANSION LLC18 citations84
US6833581B1Dec 21, 2004
Structure and method for preventing process-induced UV radiation damage in a memory cell
SPANSION LLC13 citations84
US7118967B1Oct 10, 2006
Protection of charge trapping dielectric flash memory devices from UV-induced charging in BEOL processing
SPANSION LLC15 citations82