P

Inventor

NGO MINH V

US26 patents
⚠️ This page may combine multiple inventors who share the name “NGO MINH V”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

19 patents
US6787864B2Sep 7, 2004

Mosfets incorporating nickel germanosilicided gate and methods for their formation

ADVANCED MICRO DEVICES INC126 citations98
US6562718B1May 13, 2003

Process for forming fully silicided gates

ADVANCED MICRO DEVICES INC107 citations98
US7001837B2Feb 21, 2006

Semiconductor with tensile strained substrate and method of making the same

ADVANCED MICRO DEVICES INC18 citations93
US6924182B1Aug 2, 2005

Strained silicon MOSFET having reduced leakage and method of its formation

ADVANCED MICRO DEVICES INC26 citations93
US6878592B1Apr 12, 2005

Selective epitaxy to improve silicidation

ADVANCED MICRO DEVICES INC51 citations93
US6797614B1Sep 28, 2004

Nickel alloy for SMOS process silicidation

ADVANCED MICRO DEVICES INC24 citations93
US6730576B1May 4, 2004

Method of forming a thick strained silicon layer and semiconductor structures incorporating a thick strained silicon layer

ADVANCED MICRO DEVICES INC28 citations93
US7015504B2Mar 21, 2006

Sidewall formation for high density polymer memory element array

ADVANCED MICRO DEVICES INC22 citations92
US6774432B1Aug 10, 2004

UV-blocking layer for reducing UV-induced charging of SONOS dual-bit flash memory devices in BEOL

ADVANCED MICRO DEVICES INC31 citations92
US6765254B1Jul 20, 2004

Structure and method for preventing UV radiation damage and increasing data retention in memory cells

ADVANCED MICRO DEVICES INC30 citations92
US6858503B1Feb 22, 2005

Depletion to avoid cross contamination

ADVANCED MICRO DEVICES INC10 citations74
US6806165B1Oct 19, 2004

Isolation trench fill process

ADVANCED MICRO DEVICES INC9 citations74
US5888911AMar 30, 1999

HSQ processing for reduced dielectric constant

ADVANCED MICRO DEVICES INC11 citations74
US7018896B2Mar 28, 2006

UV-blocking layer for reducing UV-induced charging of SONOS dual-bit flash memory devices in BEOL processing

ADVANCED MICRO DEVICES INC9 citations73
US5888898AMar 30, 1999

HSQ baking for reduced dielectric constant

ADVANCED MICRO DEVICES INC8 citations72
US7701019B2Apr 20, 2010

Tensile strained substrate

ADVANCED MICRO DEVICES INC2 citations63
US6893929B1May 17, 2005

Method of forming strained silicon MOSFET having improved threshold voltage under the gate ends

ADVANCED MICRO DEVICES INC6 citations63
US6982188B1Jan 3, 2006

Post CMP precursor treatment

ADVANCED MICRO DEVICES INC6 citations62
US6951220B1Oct 4, 2005

Method of decontaminating equipment

ADVANCED MICRO DEVICES INC3 citations61

SPANSION LLC

3 patents

LITTELFUSE INC

3 patents

LITTLEFUSE INC

1 patent