Inventor
ISHIHARA MASAHITO
JP15 patents
⚠️ This page may combine multiple inventors who share the name “ISHIHARA MASAHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ANELVA CORP
8 patentsUS5925227AJul 20, 1999
Multichamber sputtering apparatus
ANELVA CORP90 citations98
US5624499AApr 29, 1997
CVD apparatus
ANELVA CORP70 citations95
US7159537B2Jan 9, 2007
Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
ANELVA CORP54 citations94
US6129046AOct 10, 2000
Substrate processing apparatus
ANELVA CORP46 citations92
US6070552AJun 6, 2000
Substrate processing apparatus
ANELVA CORP26 citations92
US5944968AAug 31, 1999
Sputtering apparatus
ANELVA CORP50 citations92
US7019263B2Mar 28, 2006
Substrate heating apparatus and multi-chamber substrate processing system
ANELVA CORP11 citations83
US5956616ASep 21, 1999
Method of depositing thin films by plasma-enhanced chemical vapor deposition
ANELVA CORP12 citations73
CANON ANELVA CORP
5 patentsUS7623334B2Nov 24, 2009
Electrostatic chuck device
CANON ANELVA CORP25 citations92
US7848077B2Dec 7, 2010
Electrostatic chuck device
CANON ANELVA CORP10 citations84
US7791857B2Sep 7, 2010
Electrostatic chuck device
CANON ANELVA CORP7 citations73
US7724493B2May 25, 2010
Electrostatic chuck device
CANON ANELVA CORP5 citations73
US10738380B2Aug 11, 2020
Deposition apparatus
CANON ANELVA CORP2 citations70