Inventor
PARK SANGBONG
US32 patents
⚠️ This page may combine multiple inventors who share the name “PARK SANGBONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA CORP
13 patentsUS11416982B2Aug 16, 2022
Controlling a process for inspection of a specimen
KLA CORP2 citations73
US11776108B2Oct 3, 2023
Deep learning based defect detection
KLA CORP2 citations72
US11308606B2Apr 19, 2022
Design-assisted inspection for DRAM and 3D NAND devices
KLA CORP2 citations72
US11120546B2Sep 14, 2021
Unsupervised learning-based reference selection for enhanced defect inspection sensitivity
KLA CORP3 citations71
US11803960B2Oct 31, 2023
Optical image contrast metric for optical target search
KLA CORP0 citations62
US11783470B2Oct 10, 2023
Design-assisted inspection for DRAM and 3D NAND devices
KLA CORP0 citations62
US11748872B2Sep 5, 2023
Setting up inspection of a specimen
KLA CORP0 citations62
US11921052B2Mar 5, 2024
Inspection with previous step subtraction
KLA CORP1 citations60
US11615993B2Mar 28, 2023
Clustering sub-care areas based on noise characteristics
KLA CORP0 citations59
US12056867B2Aug 6, 2024
Image contrast metrics for deriving and improving imaging conditions
KLA CORP0 citations52
US11619592B2Apr 4, 2023
Selecting defect detection methods for inspection of a specimen
KLA CORP0 citations52
US12482091B2Nov 25, 2025
Detecting defects on specimens
KLA CORP0 citations51
US12190500B2Jan 7, 2025
Detecting defects on specimens
KLA CORP0 citations48
ASML MASKTOOLS BV
8 patentsUS7116411B2Oct 3, 2006
Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems
ASML MASKTOOLS BV27 citations92
US7824826B2Nov 2, 2010
Method and apparatus for performing dark field double dipole lithography (DDL)
ASML MASKTOOLS BV9 citations84
US7652758B2Jan 26, 2010
Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems
ASML MASKTOOLS BV11 citations83
US7494753B2Feb 24, 2009
Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation
ASML MASKTOOLS BV14 citations82
US7981576B2Jul 19, 2011
Method and apparatus for performing dark field double dipole lithography (DDL)
ASML MASKTOOLS BV5 citations74
US7614034B2Nov 3, 2009
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology
ASML MASKTOOLS BV3 citations63
US7818151B2Oct 19, 2010
Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool
ASML MASKTOOLS BV4 citations62
US7433791B2Oct 7, 2008
Method of performing multiple stage model calibration for optical imaging simulation models
ASML MASKTOOLS BV2 citations62
KLA TENCOR CORP
3 patentsUS9412673B2Aug 9, 2016
Multi-model metrology
KLA TENCOR CORP10 citations83
US11010885B2May 18, 2021
Optical-mode selection for multi-mode semiconductor inspection
KLA TENCOR CORP5 citations70
US11049745B2Jun 29, 2021
Defect-location determination using correction loop for pixel alignment
KLA TENCOR CORP0 citations58
SAMSUNG ELECTRONICS CO LTD
3 patentsUS10489902B2Nov 26, 2019
Inspection apparatus, semiconductor device manufacturing system including the same, and method of manufacturing a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD2 citations71
US10474133B2Nov 12, 2019
Inspection device for inspecting wafer and method of inspecting wafer using the same
SAMSUNG ELECTRONICS CO LTD3 citations69
US10199282B2Feb 5, 2019
Inspection apparatus and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations47