Inventor
ZWEERING RALF
DE8 patents
Patents
8 patentsUS11415895B2Aug 16, 2022
Compensation of creep effects in an imaging device
ZEISS CARL SMT GMBH4 citations70
US10168619B1Jan 1, 2019
Optical device for a lithography apparatus, and lithography apparatus
ZEISS CARL SMT GMBH4 citations69
US10809636B2Oct 20, 2020
Optical arrangement, in particular lithography system
ZEISS CARL SMT GMBH2 citations67
US12222655B2Feb 11, 2025
Stop, optical system and lithography apparatus
ZEISS CARL SMT GMBH0 citations58
US11048177B2Jun 29, 2021
Projection exposure apparatus for semiconductor lithography with improved component adjustment and adjustment method
ZEISS CARL SMT GMBH0 citations58
US10761436B2Sep 1, 2020
Optical arrangement, in particular lithography system, with a transport lock
ZEISS CARL SMT GMBH0 citations48
US11703770B2Jul 18, 2023
Compensation of creep effects in an imaging device
ZEISS CARL SMT GMBH0 citations44
US11526089B2Dec 13, 2022
Compensation of creep effects in an imaging device
ZEISS CARL SMT GMBH0 citations44