Inventor
AOKI RIICHIROU
JP21 patents
⚠️ This page may combine multiple inventors who share the name “AOKI RIICHIROU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
15 patentsUS5429995AJul 4, 1995
Method of manufacturing silicon oxide film containing fluorine
TOSHIBA KK421 citations97
US5948205ASep 7, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK41 citations96
US5914275AJun 22, 1999
Polishing apparatus and method for planarizing layer on a semiconductor wafer
TOSHIBA KK43 citations96
US5695601ADec 9, 1997
Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method
TOSHIBA KK60 citations96
US5597341AJan 28, 1997
Semiconductor planarizing apparatus
TOSHIBA KK60 citations96
US5445996AAug 29, 1995
Method for planarizing a semiconductor device having a amorphous layer
TOSHIBA KK87 citations96
US5398459AMar 21, 1995
Method and apparatus for polishing a workpiece
TOSHIBA KK74 citations96
US6443808B2Sep 3, 2002
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK14 citations93
US6439971B2Aug 27, 2002
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK20 citations93
US6425806B2Jul 30, 2002
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK14 citations93
US5641581AJun 24, 1997
Semiconductor device
TOSHIBA KK20 citations91
US4937652AJun 26, 1990
Semiconductor device and method of manufacturing the same
TOSHIBA KK25 citations91
US6273802B1Aug 14, 2001
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
TOSHIBA KK14 citations82
US4875088AOct 17, 1989
Semiconductor device having a backplate electrode
TOSHIBA KK8 citations73
US5068709ANov 26, 1991
Semiconductor device having a backplate electrode
TOSHIBA KK4 citations62
EBARA CORP
4 patentsUS5885138AMar 23, 1999
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP75 citations97
US5653623AAug 5, 1997
Polishing apparatus with improved exhaust
EBARA CORP38 citations93
US6547638B2Apr 15, 2003
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP12 citations82
US6966821B2Nov 22, 2005
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
EBARA CORP2 citations63