Inventor
STICKEL WERNER
US23 patents
⚠️ This page may combine multiple inventors who share the name “STICKEL WERNER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
15 patentsUS5466904ANov 14, 1995
Electron beam lithography system
IBM54 citations96
US4417203ANov 22, 1983
System for contactless electrical property testing of multi-layer ceramics
IBM67 citations95
US6069684AMay 30, 2000
Electron beam projection lithography system (EBPS)
IBM42 citations92
US5708274AJan 13, 1998
Curvilinear variable axis lens correction with crossed coils
IBM25 citations92
US5633507AMay 27, 1997
Electron beam lithography system with low brightness
IBM44 citations92
US5545902AAug 13, 1996
Electron beam lithography system
IBM34 citations92
US5798528AAug 25, 1998
Correction of pattern dependent position errors in electron beam lithography
IBM28 citations90
US5674413AOct 7, 1997
Scattering reticle for electron beam systems
IBM23 citations86
US5434424AJul 18, 1995
Spinning reticle scanning projection lithography exposure system and method
IBM19 citations82
US4859856AAug 22, 1989
Telecentric sub-field deflection with vail
IBM21 citations81
US5936252AAug 10, 1999
Charged particle beam performance measurement system and method thereof
IBM11 citations72
US5751004AMay 12, 1998
Projection reticle transmission control for coulomb interaction analysis
IBM12 citations72
US5712488AJan 27, 1998
Electron beam performance measurement system and method thereof
IBM15 citations72
US5285074AFeb 8, 1994
Dynamic compensation of non-linear electron beam landing angle in variable axis lenses
IBM14 citations70
US4737644AApr 12, 1988
Conductive coated semiconductor electrostatic deflection plates
IBM7 citations69
NIKON CORP
8 patentsUS6180947B1Jan 30, 2001
Multi-element deflection aberration correction for electron beam lithography
NIKON CORP62 citations96
US6617585B1Sep 9, 2003
Optimized curvilinear variable axis lens doublet for charged particle beam projection system
NIKON CORP9 citations74
US6541783B1Apr 1, 2003
Stencil reticle incorporating scattering features for electron beam projection lithography
NIKON CORP7 citations73
US6483117B1Nov 19, 2002
Symmetric blanking for high stability in electron beam exposure systems
NIKON CORP13 citations72
US6420713B1Jul 16, 2002
Image position and lens field control in electron beam systems
NIKON CORP10 citations72
US6005250ADec 21, 1999
Illumination deflection system for E-beam projection
NIKON CORP12 citations72
US6023067AFeb 8, 2000
Blanking system for electron beam projection system
NIKON CORP4 citations61
US6596999B2Jul 22, 2003
High performance source for electron beam projection lithography
NIKON CORP1 citations52