Inventor
KANNA SHINICHI
JP89 patents
⚠️ This page may combine multiple inventors who share the name “KANNA SHINICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
27 patentsUS7700260B2Apr 20, 2010
Pattern forming method
FUJIFILM CORP58 citations98
US7214467B2May 8, 2007
Photosensitive resin composition
FUJIFILM CORP38 citations93
US7611820B2Nov 3, 2009
Positive resist composition and pattern-forming method using the same
FUJIFILM CORP20 citations92
US7504194B2Mar 17, 2009
Positive resist composition and pattern making method using the same
FUJIFILM CORP16 citations92
US9465298B2Oct 11, 2016
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
FUJIFILM CORP4 citations84
US9291904B2Mar 22, 2016
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
FUJIFILM CORP6 citations84
US8034537B2Oct 11, 2011
Positive resist composition and pattern forming method
FUJIFILM CORP12 citations84
US7892722B2Feb 22, 2011
Pattern forming method
FUJIFILM CORP9 citations84
US7790351B2Sep 7, 2010
Positive resist composition and pattern making method using the same
FUJIFILM CORP11 citations84
US7635554B2Dec 22, 2009
Positive resist composition and pattern forming method
FUJIFILM CORP13 citations84
US7368220B2May 6, 2008
Positive resist composition and pattern forming method using the same
FUJIFILM CORP11 citations84
US7198880B2Apr 3, 2007
Positive resist composition
FUJIFILM CORP8 citations74
US10192651B2Jan 29, 2019
Transfer material, method of manufacturing transfer material, laminated body, method of manufacturing laminated body, method of manufacturing capacitance-type input device, and method of manufacturing image display device
FUJIFILM CORP4 citations73
US10031631B2Jul 24, 2018
Transfer film, method for producing transfer film, transparent laminate, method for producing transparent laminate, capacitance-type input device, and image display device
FUJIFILM CORP4 citations73
US9632640B2Apr 25, 2017
Transparent laminate, capacitance type input device, and image display device
FUJIFILM CORP2 citations73
US10507630B2Dec 17, 2019
Transfer film, transparent laminate, method for producing transfer film, method for producing transparent laminate, capacitive input device, and image display device
FUJIFILM CORP1 citations63
US10336043B2Jul 2, 2019
Transfer film, transparent laminate, method for producing transparent laminate, capacitive input device, and image display device
FUJIFILM CORP1 citations63
US9541831B2Jan 10, 2017
Positive resist composition and method of pattern formation with the same
FUJIFILM CORP1 citations63
US8343708B2Jan 1, 2013
Positive resist composition and pattern forming method
FUJIFILM CORP2 citations63
US7842452B2Nov 30, 2010
Pattern forming method
FUJIFILM CORP2 citations63
US7771912B2Aug 10, 2010
Positive resist composition and pattern forming method using the same
FUJIFILM CORP4 citations63
US7674567B2Mar 9, 2010
Positive resist composition and pattern forming method using the same
FUJIFILM CORP6 citations63
US7666574B2Feb 23, 2010
Positive resist composition and pattern forming method
FUJIFILM CORP5 citations63
US7482112B2Jan 27, 2009
Pattern forming method
FUJIFILM CORP2 citations63
US7335454B2Feb 26, 2008
Positive resist composition
FUJIFILM CORP5 citations63
US7195856B2Mar 27, 2007
Positive resist composition and pattern formation method using the same
FUJIFILM CORP2 citations63
US11604413B2Mar 14, 2023
Photosensitive composition, transfer film, cured film, and manufacturing method of touch panel
FUJIFILM CORP0 citations62
FUJI PHOTO FILM CO LTD
16 patentsUS6485883B2Nov 26, 2002
Positive photoresist composition
FUJI PHOTO FILM CO LTD71 citations96
US6939662B2Sep 6, 2005
Positive-working resist composition
FUJI PHOTO FILM CO LTD24 citations93
US6878502B2Apr 12, 2005
Positive resist composition
FUJI PHOTO FILM CO LTD27 citations93
US6852467B2Feb 8, 2005
Positive resist composition
FUJI PHOTO FILM CO LTD25 citations93
US6376152B2Apr 23, 2002
Positive photoresist composition
FUJI PHOTO FILM CO LTD24 citations92
US7108951B2Sep 19, 2006
Photosensitive resin composition
FUJI PHOTO FILM CO LTD16 citations84
US6756179B2Jun 29, 2004
Positive resist composition
FUJI PHOTO FILM CO LTD17 citations84
US6605409B2Aug 12, 2003
Positive resist composition
FUJI PHOTO FILM CO LTD18 citations84
US7202015B2Apr 10, 2007
Positive photoresist composition and pattern making method using the same
FUJI PHOTO FILM CO LTD8 citations74
US6830871B2Dec 14, 2004
Chemical amplification type resist composition
FUJI PHOTO FILM CO LTD7 citations74
US6727036B2Apr 27, 2004
Positive-working radiation-sensitive composition
FUJI PHOTO FILM CO LTD7 citations74
US7163776B2Jan 16, 2007
Positive-working resist composition
FUJI PHOTO FILM CO LTD5 citations63
US7138217B2Nov 21, 2006
Positive resist composition
FUJI PHOTO FILM CO LTD4 citations63
US6811947B2Nov 2, 2004
Positive resist composition
FUJI PHOTO FILM CO LTD3 citations63
US6806023B2Oct 19, 2004
Positive radiation-sensitive composition
FUJI PHOTO FILM CO LTD4 citations63
US6743565B2Jun 1, 2004
Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene
FUJI PHOTO FILM CO LTD6 citations63
TSUBAKI HIDEAKI
3 patentsUS8227183B2Jul 24, 2012
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
TSUBAKI HIDEAKI88 citations98
US8951718B2Feb 10, 2015
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
TSUBAKI HIDEAKI7 citations84
US8530148B2Sep 10, 2013
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
TSUBAKI HIDEAKI10 citations84
KANNA SHINICHI
2 patentsITO JUNICHI
1 patentMARUYAMA YOICHI
1 patentShowing the top 50 of 89 patents by PatentIndex Score.