P

Inventor

NAM JEONG-LIM

KR18 patents
⚠️ This page may combine multiple inventors who share the name “NAM JEONG-LIM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

15 patents
US8003543B2Aug 23, 2011

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD21 citations92
US7732341B2Jun 8, 2010

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD18 citations92
US7540970B2Jun 2, 2009

Methods of fabricating a semiconductor device

SAMSUNG ELECTRONICS CO LTD27 citations92
US7560768B2Jul 14, 2009

Nonvolatile memory device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD8 citations84
US6843257B2Jan 18, 2005

Wafer cleaning system

SAMSUNG ELECTRONICS CO LTD16 citations83
US6649471B2Nov 18, 2003

Method of planarizing non-volatile memory device

SAMSUNG ELECTRONICS CO LTD20 citations82
US6372042B1Apr 16, 2002

System for processing semiconductor wafers producing a downward laminar flow of clean air in front of baking units

SAMSUNG ELECTRONICS CO LTD16 citations79
US7687369B2Mar 30, 2010

Method of forming fine metal patterns for a semiconductor device using a damascene process

SAMSUNG ELECTRONICS CO LTD7 citations74
US7678650B2Mar 16, 2010

Nonvolatile memory device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD3 citations62
US7645668B2Jan 12, 2010

Charge trapping type semiconductor memory device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations62
US7089947B2Aug 15, 2006

Apparatus and method for cleaning a semiconductor wafer

SAMSUNG ELECTRONICS CO LTD2 citations62
US7017597B2Mar 28, 2006

Megasonic cleaning apparatus for fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD2 citations62
US6841338B2Jan 11, 2005

Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio

SAMSUNG ELECTRONICS CO LTD3 citations60
US7829437B2Nov 9, 2010

Method of manufacturing a semiconductor device

SAMSUNG ELECTRONICS CO LTD1 citations52
US7097949B2Aug 29, 2006

Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof

SAMSUNG ELECTRONICS CO LTD1 citations48

SAMSUNG DISPLAY CO LTD

2 patents

KOH CHA-WON

1 patent