Inventor
KODA YUZO
JP20 patents
Patents
20 patentsUS5720826AFeb 24, 1998
Photovoltaic element and fabrication process thereof
CANON KK132 citations98
US6794275B2Sep 21, 2004
Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis
CANON KK48 citations92
US6653165B2Nov 25, 2003
Methods of forming semiconductor element, and semiconductor elements
CANON KK22 citations92
US6287943B1Sep 11, 2001
Deposition of semiconductor layer by plasma process
CANON KK28 citations92
US5769963AJun 23, 1998
Photovoltaic device
CANON KK39 citations92
US5439533AAug 8, 1995
Photovoltaic device, method of producing the same and generating system using the same
CANON KK22 citations92
US5371380ADec 6, 1994
Si- and/or Ge-containing non-single crystalline semiconductor film with an average radius of 3.5 A or less as for microvoids contained therein and a microvoid density 1×10.sup.(19) (cm-3) or less
CANON KK23 citations92
US5281541AJan 25, 1994
Method for repairing an electrically short-circuited semiconductor device, and process for producing a semiconductor device utilizing said method
CANON KK23 citations92
US6495392B2Dec 17, 2002
Process for producing a semiconductor device
CANON KK17 citations84
US6447612B1Sep 10, 2002
Film-forming apparatus for forming a deposited film on a substrate, and vacuum-processing apparatus and method for vacuum-processing an object
CANON KK19 citations84
US5418680AMay 23, 1995
Apparatus for repairing an electrically short-circuited semiconductor device
CANON KK16 citations82
US6472296B2Oct 29, 2002
Fabrication of photovoltaic cell by plasma process
CANON KK7 citations74
US5510631AApr 23, 1996
Non-monocrystalline silicon carbide semiconductor and semiconductor device employing the same
CANON KK10 citations74
US5362684ANov 8, 1994
Non-monocrystalline silicon carbide semiconductor, process of production thereof, and semiconductor device employing the same
CANON KK13 citations74
US6436797B1Aug 20, 2002
Apparatus and method for forming a deposited film on a substrate
CANON KK7 citations71
US6877458B2Apr 12, 2005
Apparatus for forming deposited film
CANON KK2 citations63
US7211708B2May 1, 2007
Exhaust processing method, plasma processing method and plasma processing apparatus
CANON KK2 citations62
US6470823B2Oct 29, 2002
Apparatus and method for forming a deposited film by a means of plasma CVD
CANON KK4 citations62
US6846521B2Jan 25, 2005
Apparatus and method for forming deposited film
CANON KK0 citations52
US6632284B2Oct 14, 2003
Apparatus and method for forming deposited film
CANON KK0 citations52