Inventor
DUVALL ANDREW
US8 patents
Patents
8 patentsUS9428833B1Aug 30, 2016
Method and apparatus for backside deposition reduction by control of wafer support to achieve edge seal
LAM RES CORP353 citations97
US9758868B1Sep 12, 2017
Plasma suppression behind a showerhead through the use of increased pressure
LAM RES CORP24 citations93
US9793096B2Oct 17, 2017
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
LAM RES CORP16 citations92
US10665429B2May 26, 2020
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
LAM RES CORP6 citations83
US10622243B2Apr 14, 2020
Planar substrate edge contact with open volume equalization pathways and side containment
LAM RES CORP2 citations72
US11443975B2Sep 13, 2022
Planar substrate edge contact with open volume equalization pathways and side containment
LAM RES CORP0 citations62
US11127567B2Sep 21, 2021
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
LAM RES CORP0 citations62
US10648079B2May 12, 2020
Reducing backside deposition at wafer edge
LAM RES CORP0 citations40