P

Inventor

WU LIQI

US25 patents
⚠️ This page may combine multiple inventors who share the name “WU LIQI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

22 patents
US10014185B1Jul 3, 2018

Selective etch of metal nitride films

APPLIED MATERIALS INC22 citations92
US10608097B2Mar 31, 2020

Low thickness dependent work-function nMOS integration for metal gate

APPLIED MATERIALS INC2 citations73
US9748354B2Aug 29, 2017

Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof

APPLIED MATERIALS INC5 citations73
US9653352B2May 16, 2017

Methods for forming metal organic tungsten for middle of the line (MOL) applications

APPLIED MATERIALS INC4 citations72
US10643840B2May 5, 2020

Selective deposition defects removal by chemical etch

APPLIED MATERIALS INC2 citations70
US12024770B2Jul 2, 2024

Methods for selective deposition using self-assembled monolayers

APPLIED MATERIALS INC1 citations62
US11735420B2Aug 22, 2023

Wafer treatment for achieving defect-free self-assembled monolayers

APPLIED MATERIALS INC0 citations62
US11515155B2Nov 29, 2022

Methods for enhancing selectivity in SAM-based selective deposition

APPLIED MATERIALS INC0 citations62
US11033930B2Jun 15, 2021

Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition

APPLIED MATERIALS INC0 citations62
US10957590B2Mar 23, 2021

Method for forming a layer

APPLIED MATERIALS INC0 citations62
US10950433B2Mar 16, 2021

Methods for enhancing selectivity in SAM-based selective deposition

APPLIED MATERIALS INC1 citations62
US10770292B2Sep 8, 2020

Wafer treatment for achieving defect-free self-assembled monolayers

APPLIED MATERIALS INC1 citations62
US12291779B2May 6, 2025

Methods of selective atomic layer deposition

APPLIED MATERIALS INC0 citations61
US11821085B2Nov 21, 2023

Methods of selective atomic layer deposition

APPLIED MATERIALS INC0 citations61
US11075276B2Jul 27, 2021

Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors

APPLIED MATERIALS INC1 citations60
US12272551B2Apr 8, 2025

Selective metal removal with flowable polymer

APPLIED MATERIALS INC0 citations59
US12094785B2Sep 17, 2024

Dual silicide process using ruthenium silicide

APPLIED MATERIALS INC0 citations56
US11450525B2Sep 20, 2022

Selective aluminum oxide film deposition

APPLIED MATERIALS INC0 citations52
US12351909B2Jul 8, 2025

Gap fill methods using catalyzed deposition

APPLIED MATERIALS INC0 citations51
US12588443B2Mar 24, 2026

Methods for forming low resistivity contacts

APPLIED MATERIALS INC0 citations48
US12538542B2Jan 27, 2026

Method of forming a MEOL contact structure

APPLIED MATERIALS INC0 citations47
US11421318B2Aug 23, 2022

Methods and apparatus for high reflectivity aluminum layers

APPLIED MATERIALS INC0 citations47

ZHOU CHUNMING

1 patent

NOVELLUS SYSTEMS INC

1 patent

APPLIED MAT INC

1 patent