Inventor
WU LIQI
US25 patents
⚠️ This page may combine multiple inventors who share the name “WU LIQI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
22 patentsUS10014185B1Jul 3, 2018
Selective etch of metal nitride films
APPLIED MATERIALS INC22 citations92
US10608097B2Mar 31, 2020
Low thickness dependent work-function nMOS integration for metal gate
APPLIED MATERIALS INC2 citations73
US9748354B2Aug 29, 2017
Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof
APPLIED MATERIALS INC5 citations73
US9653352B2May 16, 2017
Methods for forming metal organic tungsten for middle of the line (MOL) applications
APPLIED MATERIALS INC4 citations72
US10643840B2May 5, 2020
Selective deposition defects removal by chemical etch
APPLIED MATERIALS INC2 citations70
US12024770B2Jul 2, 2024
Methods for selective deposition using self-assembled monolayers
APPLIED MATERIALS INC1 citations62
US11735420B2Aug 22, 2023
Wafer treatment for achieving defect-free self-assembled monolayers
APPLIED MATERIALS INC0 citations62
US11515155B2Nov 29, 2022
Methods for enhancing selectivity in SAM-based selective deposition
APPLIED MATERIALS INC0 citations62
US11033930B2Jun 15, 2021
Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition
APPLIED MATERIALS INC0 citations62
US10957590B2Mar 23, 2021
Method for forming a layer
APPLIED MATERIALS INC0 citations62
US10950433B2Mar 16, 2021
Methods for enhancing selectivity in SAM-based selective deposition
APPLIED MATERIALS INC1 citations62
US10770292B2Sep 8, 2020
Wafer treatment for achieving defect-free self-assembled monolayers
APPLIED MATERIALS INC1 citations62
US12291779B2May 6, 2025
Methods of selective atomic layer deposition
APPLIED MATERIALS INC0 citations61
US11821085B2Nov 21, 2023
Methods of selective atomic layer deposition
APPLIED MATERIALS INC0 citations61
US11075276B2Jul 27, 2021
Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors
APPLIED MATERIALS INC1 citations60
US12272551B2Apr 8, 2025
Selective metal removal with flowable polymer
APPLIED MATERIALS INC0 citations59
US12094785B2Sep 17, 2024
Dual silicide process using ruthenium silicide
APPLIED MATERIALS INC0 citations56
US11450525B2Sep 20, 2022
Selective aluminum oxide film deposition
APPLIED MATERIALS INC0 citations52
US12351909B2Jul 8, 2025
Gap fill methods using catalyzed deposition
APPLIED MATERIALS INC0 citations51
US12588443B2Mar 24, 2026
Methods for forming low resistivity contacts
APPLIED MATERIALS INC0 citations48
US12538542B2Jan 27, 2026
Method of forming a MEOL contact structure
APPLIED MATERIALS INC0 citations47
US11421318B2Aug 23, 2022
Methods and apparatus for high reflectivity aluminum layers
APPLIED MATERIALS INC0 citations47