Inventor
PARKHE VIJAY
US24 patents
⚠️ This page may combine multiple inventors who share the name “PARKHE VIJAY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
23 patentsUS6125789AOct 3, 2000
Increasing the sensitivity of an in-situ particle monitor
APPLIED MATERIALS INC564 citations99
US6503368B1Jan 7, 2003
Substrate support having bonded sections and method
APPLIED MATERIALS INC76 citations98
US6475902B1Nov 5, 2002
Chemical vapor deposition of niobium barriers for copper metallization
APPLIED MATERIALS INC380 citations98
US5903428AMay 11, 1999
Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same
APPLIED MATERIALS INC300 citations98
US6246567B1Jun 12, 2001
Apparatus for igniting a plasma in a plasma processing chamber
APPLIED MATERIALS INC50 citations96
US6190037B1Feb 20, 2001
Non-intrusive, on-the-fly (OTF) temperature measurement and monitoring system
APPLIED MATERIALS INC455 citations96
US6117246ASep 12, 2000
Conductive polymer pad for supporting a workpiece upon a workpiece support surface of an electrostatic chuck
APPLIED MATERIALS INC50 citations96
US6033482AMar 7, 2000
Method for igniting a plasma in a plasma processing chamber
APPLIED MATERIALS INC69 citations96
US5748435AMay 5, 1998
Apparatus for controlling backside gas pressure beneath a semiconductor wafer
APPLIED MATERIALS INC87 citations96
US5691876ANov 25, 1997
High temperature polyimide electrostatic chuck
APPLIED MATERIALS INC74 citations96
US6217655B1Apr 17, 2001
Stand-off pad for supporting a wafer on a substrate support chuck
APPLIED MATERIALS INC23 citations93
US6057244AMay 2, 2000
Method for improved sputter etch processing
APPLIED MATERIALS INC68 citations93
US5909355AJun 1, 1999
Ceramic electrostatic chuck and method of fabricating same
APPLIED MATERIALS INC28 citations92
US5908334AJun 1, 1999
Electrical connector for power transmission in an electrostatic chuck
APPLIED MATERIALS INC41 citations92
US5861086AJan 19, 1999
Method and apparatus for sputter etch conditioning a ceramic body
APPLIED MATERIALS INC35 citations91
US10079165B2Sep 18, 2018
Electrostatic chuck with independent zone cooling and reduced crosstalk
APPLIED MATERIALS INC6 citations84
US6547934B2Apr 15, 2003
Reduction of metal oxide in a dual frequency etch chamber
APPLIED MATERIALS INC9 citations74
US12061103B2Aug 13, 2024
Packaging design for a flow sensor and methods of manufacturing thereof
APPLIED MATERIALS INC3 citations72
US9668373B2May 30, 2017
Substrate support chuck cooling for deposition chamber
APPLIED MATERIALS INC4 citations68
US12553751B2Feb 17, 2026
Sensor assembly and methods of manufacturing thereof
APPLIED MATERIALS INC0 citations62
US6395157B2May 28, 2002
Method and apparatus for sputter etch conditioning a ceramic body
APPLIED MATERIALS INC4 citations61
US10622229B2Apr 14, 2020
Electrostatic chuck with independent zone cooling and reduced crosstalk
APPLIED MATERIALS INC0 citations52
US9865489B2Jan 9, 2018
Substrate support chuck cooling for deposition chamber
APPLIED MATERIALS INC0 citations48