Inventor
ROSENBLUTH ALAN EDWARD
US24 patents
Patents
24 patentsUS5921650AJul 13, 1999
High efficiency field-sequential color projector using two SLMs
IBM176 citations99
US5777789AJul 7, 1998
Efficient optical system for a high resolution projection display employing reflection light valves
IBM96 citations97
US7057709B2Jun 6, 2006
Printing a mask with maximum possible process window through adjustment of the source distribution
IBM45 citations96
US6082861AJul 4, 2000
Optical system and method for high contrast projection display
IBM68 citations96
US6052231AApr 18, 2000
Beam dividing elements permitting projection of an image with high contrast
IBM60 citations96
US5680588AOct 21, 1997
Method and system for optimizing illumination in an optical photolithography projection imaging system
IBM198 citations96
US7363611B2Apr 22, 2008
Printing a mask with maximum possible process window through adjustment of the source distribution
IBM19 citations92
US6636276B1Oct 21, 2003
Projection display system with at least two reflective light valves
IBM57 citations92
US6332693B1Dec 25, 2001
Apparatus and method for intensifying illumination brightness by time-superposing multiple pulsed light sources
IBM26 citations92
US6193393B1Feb 27, 2001
Apparatus and method for intensifying illumination brightness by time-superposing multiple pulsed light sources
IBM36 citations92
US6064523AMay 16, 2000
Apparatus for polarization conversion
IBM47 citations92
US5786934AJul 28, 1998
Efficient optical system for a high resolution projection display employing reflection light valves
IBM44 citations92
US5786873AJul 28, 1998
Efficient optical system for a high resolution projection display employing reflection light valves
IBM38 citations92
US5729383AMar 17, 1998
Oblique viewing microscope system
IBM30 citations89
US5715081AFeb 3, 1998
Oblique viewing microscope system
IBM23 citations89
US5673144ASep 30, 1997
Oblique viewing microscope system
IBM27 citations89
US6341038B1Jan 22, 2002
Apparatus for polarization conversion
IBM15 citations84
US6208327B1Mar 27, 2001
Camouflage of imaged post spacers and compensation of pixels that depart from nominal operating conditions by luminance diffusion
IBM15 citations83
US7712071B2May 4, 2010
Printing a mask with maximum possible process window through adjustment of the source distribution
IBM5 citations74
US7440083B2Oct 21, 2008
Printing a mask with maximum possible process window through adjustment of the source distribution
IBM2 citations63
US7127699B2Oct 24, 2006
Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process
IBM3 citations63
US6512502B2Jan 28, 2003
Lightvalve projection system in which red, green, and blue image subpixels are projected from two lightvalves and recombined using total reflection prisms
IBM4 citations61
US6080528AJun 27, 2000
Camouflage of imaged post spacers and compensation of pixels that depart from nominal operating conditions by luminance diffusion by mechanical means
IBM4 citations61
US6650383B1Nov 18, 2003
Band-shifted liquid crystal structure for projection of images without spectral distortion
IBM0 citations42