Inventor
SHIGEMATSU KOJI
JP29 patents
⚠️ This page may combine multiple inventors who share the name “SHIGEMATSU KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
15 patentsUS6259508B1Jul 10, 2001
Projection optical system and exposure apparatus and method
NIKON CORP136 citations98
US6600550B1Jul 29, 2003
Exposure apparatus, a photolithography method, and a device manufactured by the same
NIKON CORP33 citations92
US6333781B1Dec 25, 2001
Projection optical system and exposure apparatus and method
NIKON CORP37 citations92
US6084723AJul 4, 2000
Exposure apparatus
NIKON CORP31 citations92
US9423694B2Aug 23, 2016
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
NIKON CORP4 citations84
US6700645B1Mar 2, 2004
Projection optical system and exposure apparatus and method
NIKON CORP17 citations84
US10168620B2Jan 1, 2019
Illumination optical system, exposure apparatus and device manufacturing method
NIKON CORP2 citations73
US6912094B2Jun 28, 2005
Projection optical system, a projection exposure apparatus, and a projection exposure method
NIKON CORP10 citations71
US8004658B2Aug 23, 2011
Lighting optical device, exposure system, and exposure method
NIKON CORP2 citations63
US10520825B2Dec 31, 2019
Illumination optical system, exposure apparatus and device manufacturing method
NIKON CORP0 citations52
US10241417B2Mar 26, 2019
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
NIKON CORP0 citations52
US10234770B2Mar 19, 2019
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
NIKON CORP0 citations52
US9563130B2Feb 7, 2017
Illumination optical system, exposure apparatus and device manufacturing method
NIKON CORP0 citations52
US6947121B2Sep 20, 2005
Projection optical system, a projection exposure apparatus provided with the same, as well as a device manufacturing method
NIKON CORP0 citations52
US7154585B2Dec 26, 2006
Projection optical system, exposure apparatus, and device production method
NIKON CORP0 citations50
RENESAS TECH CORP
3 patentsTANITSU OSAMU
3 patentsUS9429848B2Aug 30, 2016
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
TANITSU OSAMU6 citations84
US9140990B2Sep 22, 2015
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
TANITSU OSAMU8 citations84
US10007194B2Jun 26, 2018
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
TANITSU OSAMU1 citations62