Inventor · disambiguated record
Andreas Wich-Glasen
Also filed as: WICH-GLASEN ANDREAS
8 granted patents·3 pending applications·47 citations·filing 2001–2005
82Inventor score
Top patents by PatentIndex Score
11 records- 0182US7119384B2Field effect transistor and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2002·Granted Oct 10, 2006·32 cites·19 claims
- 0252US6770530B2Method for producing a shallow trench isolation for n- and p-channel field-effect transistors in a semiconductor moduleINFINEON TECHNOLOGIES AG·Filed 2003·Granted Aug 3, 2004·6 cites·10 claims
- 0349US7223651B2Dram memory cell with a trench capacitor and method for production thereofINFINEON TECHNOLOGIES AG·Filed 2002·Granted May 29, 2007·4 cites·22 claims
- 0447US7294902B2Trench isolation having a self-adjusting surface seal and method for producing one such trench isolationINFINEON TECHNOLOGIES AG·Filed 2002·Granted Nov 13, 2007·3 cites·8 claims
- 0546US7129155B2Process for producing a plurality of gate stacks which are approximately the same height and equidistant on a semiconductor substrateINFINEON TECHNOLOGIES AG·Filed 2004·Granted Oct 31, 2006·1 cites·7 claims
- 0645US2006231874A1Field effect transistor and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2005·Application pending·0 cites
- 0740US6924209B2Method for fabricating an integrated semiconductor componentINFINEON TECHNOLOGIES AG·Filed 2001·Granted Aug 2, 2005·1 cites·18 claims
- 0837US2006231918A1Field effect transistor and method for the production thereofPOPP MARTIN·Filed 2002·Application pending·0 cites
- 0936US6989311B2Method for fabricating a trench contact to a deep trench capacitor having a polysilicon fillingINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jan 24, 2006·0 cites·11 claims
- 1033US7125778B2Method for fabricating a self-aligning maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Oct 24, 2006·0 cites·14 claims
- 1130US2003003682A1Method for manufacturing an isolation trench filled with a high-density plasma-chemical vapor deposition oxideFiled 2002·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →