Inventor
WAN FEN
US28 patents
⚠️ This page may combine multiple inventors who share the name “WAN FEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
22 patentsUS10892167B2Jan 12, 2021
Gas permeable superstrate and methods of using the same
CANON KK7 citations79
US10509313B2Dec 17, 2019
Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
CANON KK3 citations72
US12428508B2Sep 30, 2025
Photocurable composition including a non-reactive polymer
CANON KK0 citations62
US12189289B2Jan 7, 2025
Photo-curable composition and methods for preparing cured film, optical component, circuit substrate, electrical component and replica mold using the same
CANON KK0 citations62
US12136564B2Nov 5, 2024
Superstrate and method of making it
CANON KK0 citations62
US12105416B2Oct 1, 2024
Photocurable composition comprising an organic ionic compound
CANON KK0 citations62
US12061416B2Aug 13, 2024
Photocurable composition comprising a fullerene
CANON KK0 citations62
US11981759B2May 14, 2024
Photocurable composition
CANON KK0 citations62
US11945966B2Apr 2, 2024
Photocurable composition with enhanced thermal stability
CANON KK0 citations62
US11835858B2Dec 5, 2023
Photo-curable composition and methods for preparing cured film, optical component, circuit substrate, electrical component and replica mold using the same
CANON KK0 citations62
US11753497B2Sep 12, 2023
Photocurable composition
CANON KK0 citations62
US11597781B2Mar 7, 2023
Photocurable composition for making layers with high etch resistance
CANON KK0 citations62
US11549020B2Jan 10, 2023
Curable composition for nano-fabrication
CANON KK0 citations62
US11434313B2Sep 6, 2022
Curable composition for making cured layer with high thermal stability
CANON KK0 citations62
US11434312B2Sep 6, 2022
Photocurable composition for forming cured layers with high thermal stability
CANON KK0 citations62
US10189188B2Jan 29, 2019
Nanoimprint lithography adhesion layer
CANON KK1 citations62
US12275854B2Apr 15, 2025
Curable composition, film forming method and article manufacturing method
CANON KK0 citations60
US10488753B2Nov 26, 2019
Substrate pretreatment and etch uniformity in nanoimprint lithography
CANON KK1 citations59
US11945893B2Apr 2, 2024
Curable composition
CANON KK1 citations57
US12247133B2Mar 11, 2025
Photocurable composition including a reactive polymer
CANON KK0 citations51
US10780682B2Sep 22, 2020
Liquid adhesion composition, multi-layer structure and method of making said structure
CANON KK0 citations51
US10317793B2Jun 11, 2019
Substrate pretreatment compositions for nanoimprint lithography
CANON KK0 citations41