Inventor
TSUCHIYA KOHSUKE
JP21 patents
⚠️ This page may combine multiple inventors who share the name “TSUCHIYA KOHSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIMI INC
19 patentsUS9579769B2Feb 28, 2017
Composition for polishing purposes, polishing method using same, and method for producing substrate
FUJIMI INC3 citations72
US9566685B2Feb 14, 2017
Polishing composition and method for producing polished article
FUJIMI INC3 citations70
US9206336B2Dec 8, 2015
Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrate
FUJIMI INC2 citations61
US11976220B2May 7, 2024
Polishing composition and method for producing same
FUJIMI INC0 citations60
US11421131B2Aug 23, 2022
Polishing composition and method for producing same
FUJIMI INC0 citations60
US10344185B2Jul 9, 2019
Composition for polishing silicon wafers
FUJIMI INC1 citations60
US10351732B2Jul 16, 2019
Polishing composition, method for producing polishing composition and polishing composition preparation kit
FUJIMI INC1 citations59
US11130883B2Sep 28, 2021
Polishing composition
FUJIMI INC0 citations57
US11332640B2May 17, 2022
Polishing composition and polishing method using same
FUJIMI INC0 citations54
US10227518B2Mar 12, 2019
Polishing composition and method for producing same
FUJIMI INC0 citations51
US9944838B2Apr 17, 2018
Polishing composition and method for producing same
FUJIMI INC0 citations51
US10717899B2Jul 21, 2020
Polishing composition, method for producing polishing composition and polishing composition preparation kit
FUJIMI INC0 citations48
US11939491B2Mar 26, 2024
Method of polishing object to be polished containing material having silicon-silicon bond
FUJIMI INC0 citations43
US9505950B2Nov 29, 2016
Polishing composition and method for producing substrate
FUJIMI INC0 citations41
US10748778B2Aug 18, 2020
Method for polishing silicon wafer and surface treatment composition
FUJIMI INC0 citations40
US10745588B2Aug 18, 2020
Silicon wafer polishing composition
FUJIMI INC0 citations39
US9685341B2Jun 20, 2017
Abrasive composition and method for producing semiconductor substrate
FUJIMI INC0 citations39
US9650544B2May 16, 2017
Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate
FUJIMI INC0 citations36
US10273383B2Apr 30, 2019
Polishing composition for silicon wafer and polishing method
FUJIMI INC0 citations32