Inventor

NARIZUKA SATORU

JP50 patents

⚠️ This page may combine multiple inventors who share the name “NARIZUKA SATORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NARIZUKA SATORU

CENTRAL GLASS CO LTD

Fluorine-containing polymerizable monomer and polymer compound using same

Process for producing trifluoromethylbenzylamines

Fluorine-containing polymerizable monomer and polymer compound using same

Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same

Process for producing alkoxycarbonylfluoroalkanesulfonates

Method of producing benzamides

Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same

Process for producing trifluoromethylbenzylamines

Fluorine-containing polymerizable monomer and polymer compound using same

Fluorine-containing polymerizable monomer and polymer compound using same

Process for producing trifluoromethylbenzylamines

Positive-type resist composition

Process for producing trifluoromethylbenzylamines

Method for producing benzoic acid derivatives

Process for producing brominated trifluoromethylbenzenes

2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same

Fluorine-containing dicarboxylic acids and their novel polymer compounds

Method for producing palladium complex compound

Method for producing palladium complex compound

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

IBM

Non-ionic photo-acid generating polymers for resist applications

Lithium oxygen battery and electrolyte composition

Lithium oxygen battery and electrolyte composition

Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators

Non-ionic low diffusing photo-acid generators

Non-ionic aryl ketone based polymeric photo-acid generators

ISONO YOSHIMI

Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same

Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same

Polymerizable fluorine-containing compound

Fluorinated dicarboxylic acid derivative and polymer obtained therefrom

HAGIWARA YUJI

2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same

Compound for photoacid generator, resist composition using the same, and pattern-forming method

Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt

MORI KAZUNORI

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method

Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same

NAGAMORI MASASHI

Salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method

Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt

Fluoroalkanesulfonic acid ammonium salts and method for producing same

JODRY JONATHAN JOACHIM

Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt

Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt

MAEDA KAZUHIKO

Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent

Top coating composition

TAKIHANA RYOZO

Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same

Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same

JSR CORP

Polymerizable sulfonic acid onium salt and resin

MASUBUCHI TAKASHI

Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same

NARIZUKA SATORU

Fluorine-containing dicarboxylic acids and their novel polymer compounds

KATO MISUGI

Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method

NAGAMORI MAGASHI

Ammonium fluoroalkanesulfonates and a synthesis method therefor