Inventor
PARK JUNG-DAE
KR13 patents
⚠️ This page may combine multiple inventors who share the name “PARK JUNG-DAE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
12 patentsUS7951653B1May 31, 2011
Methods of manufacturing a semiconductor device using compositions for etching copper
SAMSUNG ELECTRONICS CO LTD15 citations83
US7351667B2Apr 1, 2008
Etching solution for silicon oxide method of manufacturing a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD10 citations83
US7943562B2May 17, 2011
Semiconductor substrate cleaning methods, and methods of manufacture using same
SAMSUNG ELECTRONICS CO LTD9 citations82
US10495615B2Dec 3, 2019
Evaluation systems of block copolymer patterns
SAMSUNG ELECTRONICS CO LTD2 citations71
US7985297B2Jul 26, 2011
Method of cleaning a quartz part
SAMSUNG ELECTRONICS CO LTD3 citations60
US8043974B2Oct 25, 2011
Semiconductor wet etchant and method of forming interconnection structure using the same
SAMSUNG ELECTRONICS CO LTD4 citations57
US10790176B2Sep 29, 2020
Substrate carrier
SAMSUNG ELECTRONICS CO LTD1 citations51
US9528949B2Dec 27, 2016
Methods of detecting inhomogeneity of a layer and apparatus for performing the same
SAMSUNG ELECTRONICS CO LTD1 citations50
US7795198B2Sep 14, 2010
Composition for removing a polymeric contaminant and method of removing a polymeric contaminant using the same
SAMSUNG ELECTRONICS CO LTD0 citations50
US7687448B2Mar 30, 2010
Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition
SAMSUNG ELECTRONICS CO LTD0 citations49
US7608540B2Oct 27, 2009
Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition
SAMSUNG ELECTRONICS CO LTD0 citations49
US7678751B2Mar 16, 2010
Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD1 citations48