Inventor
LAN CHIN KUN
TW19 patents
⚠️ This page may combine multiple inventors who share the name “LAN CHIN KUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
13 patentsUS10879456B2Dec 29, 2020
Sidewall spacer stack for magnetic tunnel junctions
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US11139200B2Oct 5, 2021
Multi-layer structure having a dense middle layer
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10510586B1Dec 17, 2019
Multi-layer structure having a dense middle layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US12315812B2May 27, 2025
Semiconductor structure having high breakdown voltage etch-stop layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12310257B2May 20, 2025
Spacer scheme and method for MRAM
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12268096B2Apr 1, 2025
Spacer stack for magnetic tunnel junctions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11961803B2Apr 16, 2024
Semiconductor structure having high breakdown voltage etch-stop layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11818964B2Nov 14, 2023
Spacer scheme and method for MRAM
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11785858B2Oct 10, 2023
Methods for forming a spacer stack for magnetic tunnel junctions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11769692B2Sep 26, 2023
High breakdown voltage inter-metal dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11488825B2Nov 1, 2022
Multi-layer mask and method of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11283005B2Mar 22, 2022
Spacer scheme and method for MRAM
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10748765B2Aug 18, 2020
Multi-layer mask and method of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
TAIWAN SEMICONDUCTOR MFG
5 patentsUS6407007B1Jun 18, 2002
Method to solve the delamination of a silicon nitride layer from an underlying spin on glass layer
TAIWAN SEMICONDUCTOR MFG21 citations92
US7968431B2Jun 28, 2011
Diffusion region routing for narrow scribe-line devices
TAIWAN SEMICONDUCTOR MFG11 citations81
US6287172B1Sep 11, 2001
Method for improvement of tungsten chemical-mechanical polishing process
TAIWAN SEMICONDUCTOR MFG10 citations73
US7955993B2Jun 7, 2011
Oxygen plasma reduction to eliminate precursor overflow in BPTEOS film deposition
TAIWAN SEMICONDUCTOR MFG2 citations62
US6645825B1Nov 11, 2003
Planarization of shallow trench isolation (STI)
TAIWAN SEMICONDUCTOR MFG6 citations62