Inventor
KANNO ITARU
JP40 patents
⚠️ This page may combine multiple inventors who share the name “KANNO ITARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
17 patentsUS9953826B2Apr 24, 2018
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD15 citations92
US10272478B2Apr 30, 2019
Substrate processing system, substrate cleaning method, and recording medium
TOKYO ELECTRON LTD7 citations83
US9378940B2Jun 28, 2016
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD9 citations82
US8037891B2Oct 18, 2011
Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus
TOKYO ELECTRON LTD8 citations78
US10998183B2May 4, 2021
Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium
TOKYO ELECTRON LTD2 citations73
US11367630B2Jun 21, 2022
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD3 citations72
US10835908B2Nov 17, 2020
Substrate processing method
TOKYO ELECTRON LTD2 citations72
US10811283B2Oct 20, 2020
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD2 citations72
US10734255B2Aug 4, 2020
Substrate cleaning method, substrate cleaning system and memory medium
TOKYO ELECTRON LTD6 citations72
US10043652B2Aug 7, 2018
Substrate cleaning method, substrate cleaning system, and memory medium
TOKYO ELECTRON LTD5 citations72
US9818598B2Nov 14, 2017
Substrate cleaning method and recording medium
TOKYO ELECTRON LTD4 citations72
US9799538B2Oct 24, 2017
Substrate cleaning system
TOKYO ELECTRON LTD6 citations72
US10792711B2Oct 6, 2020
Substrate processing system, substrate cleaning method, and recording medium
TOKYO ELECTRON LTD1 citations62
US9443712B2Sep 13, 2016
Substrate cleaning method and substrate cleaning system
TOKYO ELECTRON LTD2 citations62
US11201050B2Dec 14, 2021
Substrate processing method, recording medium and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US10083845B2Sep 25, 2018
Substrate processing apparatus, substrate processing method and storage medium
TOKYO ELECTRON LTD0 citations42
US10242889B2Mar 26, 2019
Substrate liquid processing method and substrate liquid processing apparatus
TOKYO ELECTRON LTD0 citations41
MITSUBISHI ELECTRIC CORP
13 patentsUS5934566AAug 10, 1999
Washing apparatus and washing method
MITSUBISHI ELECTRIC CORP90 citations97
US5216890AJun 8, 1993
Device for and method of producing hyperfine frozen particles
MITSUBISHI ELECTRIC CORP65 citations96
US5147466ASep 15, 1992
Method of cleaning a surface by blasting the fine frozen particles against the surface
MITSUBISHI ELECTRIC CORP52 citations96
US6048409AApr 11, 2000
Washing apparatus and washing method
MITSUBISHI ELECTRIC CORP73 citations95
US5918817AJul 6, 1999
Two-fluid cleaning jet nozzle and cleaning apparatus, and method utilizing the same
MITSUBISHI ELECTRIC CORP59 citations94
US5746233AMay 5, 1998
Washing apparatus and method therefor
MITSUBISHI ELECTRIC CORP26 citations93
US5283989AFeb 8, 1994
Apparatus for polishing an article with frozen particles
MITSUBISHI ELECTRIC CORP89 citations93
US6358329B1Mar 19, 2002
Resist residue removal apparatus and method
MITSUBISHI ELECTRIC CORP20 citations92
US5873380AFeb 23, 1999
Wafer cleaning apparatus
MITSUBISHI ELECTRIC CORP49 citations92
US5074083ADec 24, 1991
Cleaning device using fine frozen particles
MITSUBISHI ELECTRIC CORP30 citations92
US6199567B1Mar 13, 2001
Method and apparatus for manufacturing semiconductor device
MITSUBISHI ELECTRIC CORP16 citations82
US6092537AJul 25, 2000
Post-treatment method for dry etching
MITSUBISHI ELECTRIC CORP4 citations63
US5357718AOct 25, 1994
Wafer rinsing apparatus
MITSUBISHI ELECTRIC CORP6 citations63
RENESAS TECH CORP
3 patentsUS6708903B2Mar 23, 2004
Two-fluid cleaning jet nozzle, cleaning equipment and method of fabricating semiconductor device employing the same
RENESAS TECH CORP11 citations74
US6730239B1May 4, 2004
Cleaning agent for semiconductor device & method of fabricating semiconductor device
RENESAS TECH CORP7 citations71
US7537987B2May 26, 2009
Semiconductor device manufacturing method
RENESAS TECH CORP0 citations39