Inventor · disambiguated record
Youko Shimizu
Also filed as: SHIMIZU YOUKO
5 granted patents·8 citations·filing 2016–2020
71Inventor score
Files withMITSUBISHI GAS CHEMICAL CO5
Top patents by PatentIndex Score
5 records- 0186US10642156B2Resist base material, resist composition and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted May 5, 2020·2 cites·14 claims
- 0283US11572430B2Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2020·Granted Feb 7, 2023·1 cites·1 claims
- 0382US11243467B2Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Feb 8, 2022·2 cites·13 claims
- 0478US11256170B2Compound, resist composition, and method for forming resist pattern using itMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Feb 22, 2022·2 cites·20 claims
- 0576US11480877B2Resist composition, method for forming resist pattern, and polyphenol compound used thereinMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Oct 25, 2022·1 cites·21 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →