Inventor
USA TOSHIHIRO
JP28 patents
⚠️ This page may combine multiple inventors who share the name “USA TOSHIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
17 patentsUS8049190B2Nov 1, 2011
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
FUJIFILM CORP7 citations84
US10195768B2Feb 5, 2019
Method of manufacturing mold and method of manufacturing pattern sheet
FUJIFILM CORP2 citations71
US7850441B2Dec 14, 2010
Mold structure
FUJIFILM CORP6 citations63
US7807988B2Oct 5, 2010
Electron beam lithography apparatus and method for compensating for electron beam misalignment
FUJIFILM CORP3 citations63
USD1001852SOct 17, 2023
Soft mold transfer container
FUJIFILM CORP0 citations61
USD983848SApr 18, 2023
Soft mold transfer container lid
FUJIFILM CORP0 citations61
USD983240SApr 11, 2023
Soft mold transfer container
FUJIFILM CORP0 citations61
US11141887B2Oct 12, 2021
Production method of mold having recessed pattern, and manufacturing method of pattern sheet
FUJIFILM CORP0 citations61
US11198234B2Dec 14, 2021
Mold case and manufacturing method of microneedle array
FUJIFILM CORP0 citations59
US10926438B2Feb 23, 2021
Production method of mold having recessed pedestal pattern, and manufacturing method of pattern sheet
FUJIFILM CORP0 citations59
US11772305B2Oct 3, 2023
Production method of mold having recessed pattern in recessed step portion
FUJIFILM CORP0 citations57
US11534943B2Dec 27, 2022
Production method of mold having recessed pattern in recessed step portion, and manufacturing method of pattern sheet
FUJIFILM CORP1 citations57
US8030625B2Oct 4, 2011
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
FUJIFILM CORP1 citations52
US7972764B2Jul 5, 2011
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
FUJIFILM CORP1 citations52
US8031436B2Oct 4, 2011
Electron beam writing method for magnetic recording medium
FUJIFILM CORP0 citations42
US7973297B2Jul 5, 2011
Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
FUJIFILM CORP0 citations42
US7641822B2Jan 5, 2010
Master information carrier for magnetic transfer and a method for producing the carrier
FUJIFILM CORP0 citations42
FUJI PHOTO FILM CO LTD
10 patentsUS7026098B2Apr 11, 2006
Electron beam lithography method
FUJI PHOTO FILM CO LTD31 citations92
US6967815B2Nov 22, 2005
Method of depicting a pattern with electron beam and disc-like substrate and magnetic recording medium
FUJI PHOTO FILM CO LTD7 citations74
US6833969B2Dec 21, 2004
Master information carrier for magnetic transfer
FUJI PHOTO FILM CO LTD10 citations74
US6816327B2Nov 9, 2004
Master information carrier for magnetic transfer and magnetic transfer method
FUJI PHOTO FILM CO LTD8 citations74
US7229743B2Jun 12, 2007
Electron beam lithography method, patterned master carrier for magnetic transfer, lithography method for patterned master carrier for magnetic transfer, and method for producing performatted magnetic recording media
FUJI PHOTO FILM CO LTD3 citations63
US7094481B2Aug 22, 2006
Master information carrier for magnetic transfer and magnetic transfer method
FUJI PHOTO FILM CO LTD2 citations63
US6921499B2Jul 26, 2005
Master carrier for magnetic transfer
FUJI PHOTO FILM CO LTD4 citations63
US6911270B2Jun 28, 2005
Master information carrier for magnetic transfer
FUJI PHOTO FILM CO LTD3 citations63
US6867935B2Mar 15, 2005
Magnetic transfer apparatus
FUJI PHOTO FILM CO LTD3 citations63
US7141356B2Nov 28, 2006
Electron beam lithography method
FUJI PHOTO FILM CO LTD1 citations52