Inventor

HIRANO AKITO

JP11 patents

⚠️ This page may combine multiple inventors who share the name “HIRANO AKITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI INT ELECTRIC INC

4 patents

US9236242B2Jan 12, 2016

Substrate processing method and substrate processing apparatus

HITACHI INT ELECTRIC INC6 citations82

US9754780B2Sep 5, 2017

Substrate processing method and substrate processing apparatus

HITACHI INT ELECTRIC INC1 citations61

US10049870B2Aug 14, 2018

Method of manufacturing semiconductor device including silicon nitride layer for inhibiting excessive oxidation of polysilicon film

HITACHI INT ELECTRIC INC0 citations50

US7795156B2Sep 14, 2010

Producing method of semiconductor device

HITACHI INT ELECTRIC INC0 citations40

KOKUSAI ELECTRIC CORP

3 patents

US10840094B2Nov 17, 2020

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP4 citations71

US10192735B2Jan 29, 2019

Substrate processing method and substrate processing apparatus

KOKUSAI ELECTRIC CORP2 citations71

US12435439B2Oct 7, 2025

Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus

KOKUSAI ELECTRIC CORP0 citations59

UEDA TATSUSHI

2 patents

US8334215B2Dec 18, 2012

Substrate processing method and substrate processing apparatus

UEDA TATSUSHI5 citations70

US8066894B2Nov 29, 2011

Substrate processing method and substrate processing apparatus

UEDA TATSUSHI2 citations59

HIRANO AKITO

1 patent

US8133820B2Mar 13, 2012

Substrate processing method and substrate processing apparatus

HIRANO AKITO3 citations55

HORIE TADASHI

1 patent

US8178445B2May 15, 2012

Substrate processing apparatus and manufacturing method of semiconductor device using plasma generation

HORIE TADASHI0 citations37