Inventor

WEGE STEPHAN

DE26 patents

⚠️ This page may combine multiple inventors who share the name “WEGE STEPHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WEGE STEPHAN

INFINEON TECHNOLOGIES AG

Method of structuring layers with a polysilicon layer and an overlying metal or metal silicide layer using a three step etching process with fluorine, chlorine, bromine containing gases

Method for improving the readability of alignment marks

Method for fabricating a trench isolation for electrically active components

Method of structuring a metal-containing layer

Apparatus for processing a substrate

Method for manufacturing a conductor structure for an integrated circuit

Production method for a semiconductor component

CVD method of producing in situ-doped polysilicon layers and polysilicon layered structures

Method for production of a semiconductor structure

Photolithographic patterning process using a carbon hard mask layer of diamond-like hardness produced by a plasma-enhanced deposition process

Fabrication method for a semiconductor structure

Method and device for producing a metal/metal contact in a multilayer metallization of an integrated circuit

Dielectric filling of electrical wiring planes

Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding use of the etching mask

Deposition of various base layers for selective layer growth in semiconductor production

Method of producing a semiconductor device comprising a cleaning process for removing silicon-containing material

Method for fabricating a semiconductor structure

CMP process

APPLIED MATERIALS INC

Method for etching high-aspect-ratio features

Method of preventing etch profile bending and bowing in high aspect ratio openings by treating a polymer formed on the opening sidewalls

QIMONDA AG

Method for forming a structure on a substrate and device

Method of preparing a coating solution and a corresponding use of the coating solution for coating a substrate

INFINEON TECHNOLOGIES CORP

Metallization etching techniques for reducing post-etch corrosion of metal lines

WEGE STEPHAN

Gas injector for reaction regions

SILICON STORAGE TECH INC

Method of forming a self-aligned stack gate structure for use in a non-volatile memory array

TOREN WILLEM-JAN

Self-aligned stack gate structure for use in a non-volatile memory array and a method of forming such structure