P

Inventor

HARADA KOJI

JP89 patents
⚠️ This page may combine multiple inventors who share the name “HARADA KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

16 patents
US6402509B1Jun 11, 2002

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD53 citations96
US5488964AFeb 6, 1996

Washing apparatus, and washing method

TOKYO ELECTRON LTD45 citations95
US6190458B1Feb 20, 2001

Apparatus for eliminating impurities by ozone generated in space above substrate surface and film forming method and system therewith

TOKYO ELECTRON LTD32 citations93
US6156125ADec 5, 2000

Adhesion apparatus

TOKYO ELECTRON LTD26 citations93
US6686571B2Feb 3, 2004

Heat treatment unit, cooling unit and cooling treatment method

TOKYO ELECTRON LTD24 citations92
US6644965B2Nov 11, 2003

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD43 citations92
US6461438B1Oct 8, 2002

Heat treatment unit, cooling unit and cooling treatment method

TOKYO ELECTRON LTD34 citations92
US6402844B1Jun 11, 2002

Substrate processing method and substrate processing unit

TOKYO ELECTRON LTD23 citations92
US5887604AMar 30, 1999

Washing apparatus, and washing method

TOKYO ELECTRON LTD21 citations92
US5782990AJul 21, 1998

Method for washing objects

TOKYO ELECTRON LTD23 citations92
US5671764ASep 30, 1997

Washing apparatus, and washing method

TOKYO ELECTRON LTD21 citations92
US6654668B1Nov 25, 2003

Processing apparatus, processing system, distinguishing method, and detecting method

TOKYO ELECTRON LTD36 citations91
US6368776B1Apr 9, 2002

Treatment apparatus and treatment method

TOKYO ELECTRON LTD36 citations91
US6202653B1Mar 20, 2001

Processing solution supplying apparatus, processing apparatus and processing method

TOKYO ELECTRON LTD35 citations90
US6402508B2Jun 11, 2002

Heat and cooling treatment apparatus and substrate processing system

TOKYO ELECTRON LTD19 citations84
US6465055B2Oct 15, 2002

Apparatus for eliminating impurities by ozone generated in space above substrate surface and film forming method and system therewith

TOKYO ELECTRON LTD2 citations63

HITACHI LTD

7 patents

CANON KK

6 patents

SEIKO EPSON CORP

4 patents

KONICA MINOLTA INC

4 patents

HARADA KOJI

3 patents

HITACHI SHIPBUILDING ENG CO

2 patents

ONKYO KK

1 patent

KOBE STEEL LTD

1 patent

KONICA MINOLTA SENSING INC

1 patent

HITACHI AUTOMOTIVE SYSTEMS LTD

1 patent

MINOLTA CO LTD

1 patent

DYNAX CORP

1 patent

NIDEC CORP

1 patent

AGILENT TECHNOLOGIES INC

1 patent

Showing the top 50 of 89 patents by PatentIndex Score.