Inventor
STEPPAN HARTMUT
US15 patents
⚠️ This page may combine multiple inventors who share the name “STEPPAN HARTMUT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST AG
14 patentsUS4966828AOct 30, 1990
Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compounds
HOECHST AG31 citations92
US4506003AMar 19, 1985
Positive-working radiation-sensitive mixture
HOECHST AG42 citations92
US3985566AOct 12, 1976
Photosensitive crosslinkable 1-carbonyloxy-1H-naphthalene-2-one polymers and process for their preparation
HOECHST AG19 citations82
US4776892AOct 11, 1988
Process for stripping light-hardened photoresist layers
HOECHST AG22 citations81
US5217845AJun 8, 1993
Photopolymerizable mixture and photopolymerizable copying material containing same
HOECHST AG11 citations73
US5200299AApr 6, 1993
Quinoline and acridine compounds effective as photoinitiators and containing polymerizable (meth)acryloyl substituents
HOECHST AG18 citations73
US4956264ASep 11, 1990
Radiation-polymerizable mixture
HOECHST AG16 citations73
US4659645AApr 21, 1987
Photosensitive mixture and photosensitive recording material with diazonium salt polycondensation product and free radical radiation polymerizable composition
HOECHST AG20 citations73
US4021243AMay 3, 1977
Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils
HOECHST AG10 citations73
US3969323AJul 13, 1976
Photo-crosslinkable 2-pyrone polymers and processes for the manufacture thereof
HOECHST AG17 citations73
US4401520AAug 30, 1983
Process for the preparation of screen printing stencils by an electroplating method
HOECHST AG16 citations71
US5162190ANov 10, 1992
1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds
HOECHST AG5 citations63
US4661432AApr 28, 1987
Light-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material containing this polycondensation product
HOECHST AG4 citations62
US4159202AJun 26, 1979
Photopolymer having 2-pyridone side group
HOECHST AG5 citations62