Inventor
TSUJI NAOTO
JP37 patents
⚠️ This page may combine multiple inventors who share the name “TSUJI NAOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASM IP HOLDING BV
21 patentsUS9370863B2Jun 21, 2016
Anti-slip end-effector for transporting workpiece
ASM IP HOLDING BV473 citations99
USD753269SApr 5, 2016
Top plate
ASM IP HOLDING BV479 citations99
USD743513SNov 17, 2015
Seal ring
ASM IP HOLDING BV548 citations99
USD735836SAug 4, 2015
Shower plate
ASM IP HOLDING BV527 citations99
USD733843SJul 7, 2015
Shower plate
ASM IP HOLDING BV523 citations99
USD733261SJun 30, 2015
Top plate
ASM IP HOLDING BV530 citations99
USD732644SJun 23, 2015
Top plate
ASM IP HOLDING BV540 citations99
USD732145SJun 16, 2015
Shower plate
ASM IP HOLDING BV528 citations99
USD726884SApr 14, 2015
Heater block
ASM IP HOLDING BV528 citations99
USD725168SMar 24, 2015
Heater block
ASM IP HOLDING BV507 citations99
USD724701SMar 17, 2015
Shower plate
ASM IP HOLDING BV528 citations99
USD720838SJan 6, 2015
Shower plate
ASM IP HOLDING BV548 citations99
US8912101B2Dec 16, 2014
Method for forming Si-containing film using two precursors by ALD
ASM IP HOLDING BV522 citations99
US9018093B2Apr 28, 2015
Method for forming layer constituted by repeated stacked layers
ASM IP HOLDING BV519 citations97
US9963782B2May 8, 2018
Semiconductor manufacturing apparatus
ASM IP HOLDING BV10 citations84
US10844484B2Nov 24, 2020
Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
ASM IP HOLDING BV10 citations83
US9885112B2Feb 6, 2018
Film forming apparatus
ASM IP HOLDING BV5 citations73
US10435789B2Oct 8, 2019
Substrate treatment apparatus
ASM IP HOLDING BV4 citations70
US11339476B2May 24, 2022
Substrate processing device having connection plates, substrate processing method
ASM IP HOLDING BV3 citations68
US11118262B2Sep 14, 2021
Substrate processing apparatus having a gas-mixing manifold
ASM IP HOLDING BV1 citations63
US12431334B2Sep 30, 2025
Gas distribution assembly
ASM IP HOLDING BV0 citations47
ASM JAPAN
13 patentsUS7955650B2Jun 7, 2011
Method for forming dielectric film using porogen gas
ASM JAPAN464 citations99
US7807566B2Oct 5, 2010
Method for forming dielectric SiOCH film having chemical stability
ASM JAPAN464 citations99
US6740602B1May 25, 2004
Method of forming low-dielectric constant film on semiconductor substrate by plasma reaction using high-RF power
ASM JAPAN65 citations96
US6818570B2Nov 16, 2004
Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength
ASM JAPAN35 citations92
US7418921B2Sep 2, 2008
Plasma CVD apparatus for forming uniform film
ASM JAPAN14 citations84
US7147900B2Dec 12, 2006
Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
ASM JAPAN6 citations63
US7012268B2Mar 14, 2006
Gas-shield electron-beam gun for thin-film curing application
ASM JAPAN2 citations63
US7641761B2Jan 5, 2010
Apparatus and method for forming thin film using surface-treated shower plate
ASM JAPAN6 citations61
US7037855B2May 2, 2006
Method of forming fluorine-doped low-dielectric-constant insulating film
ASM JAPAN3 citations61
US7098129B2Aug 29, 2006
Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same
ASM JAPAN3 citations60
US7799134B2Sep 21, 2010
Shower plate having projections and plasma CVD apparatus using same
ASM JAPAN1 citations51
US6905978B2Jun 14, 2005
Method of forming interlayer insulation film
ASM JAPAN1 citations51
US7718544B2May 18, 2010
Method of forming silicon-containing insulation film having low dielectric constant and low diffusion coefficient
ASM JAPAN1 citations48