P

Inventor

NAKASHIMA HIROMITSU

JP31 patents
⚠️ This page may combine multiple inventors who share the name “NAKASHIMA HIROMITSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JSR CORP

17 patents
US11681222B2Jun 20, 2023

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations61
US11036133B2Jun 15, 2021

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations61
US9268219B2Feb 23, 2016

Photoresist composition and resist pattern-forming method

JSR CORP2 citations61
US9116427B2Aug 25, 2015

Composition for forming resist underlayer film and pattern-forming method

JSR CORP2 citations61
US9046765B2Jun 2, 2015

Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film

JSR CORP2 citations61
US9513548B2Dec 6, 2016

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

JSR CORP2 citations60
US12560866B2Feb 24, 2026

Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound

JSR CORP0 citations59
US11603459B2Mar 14, 2023

Resin composition and method of forming resist pattern

JSR CORP0 citations57
US11130856B2Sep 28, 2021

Resin composition and method of forming resist pattern

JSR CORP0 citations57
US10620534B2Apr 14, 2020

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51
US10564546B2Feb 18, 2020

Resist pattern-forming method

JSR CORP1 citations51
US10082733B2Sep 25, 2018

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51
US10048586B2Aug 14, 2018

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

JSR CORP0 citations51
US9500950B2Nov 22, 2016

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51
US9213236B2Dec 15, 2015

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51
US9158196B2Oct 13, 2015

Radiation-sensitive resin composition and pattern-forming method

JSR CORP1 citations51
US8609321B2Dec 17, 2013

Radiation-sensitive resin composition, polymer and compound

JSR CORP0 citations51

NAKAMURA ATSUSHI

2 patents

SATO MITSUO

2 patents

NAKAGAWA HIROKI

1 patent

KIMURA TORU

1 patent

ASANO YUUSUKE

1 patent

NAKAHARA KAZUO

1 patent

NAKASHIMA HIROMITSU

1 patent

IKEDA NORIHIKO

1 patent

NISHIMURA YUKIO

1 patent

KOUNO DAITA

1 patent

KIRIDOSHI Yuko

1 patent

KAMAKURA TAKAYUKI

1 patent