P

Inventor

NISHIMURA YUKIO

JP52 patents
⚠️ This page may combine multiple inventors who share the name “NISHIMURA YUKIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JSR CORP

23 patents
US6908722B2Jun 21, 2005

Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition

JSR CORP200 citations98
US6933094B2Aug 23, 2005

Radiation-sensitive resin composition

JSR CORP17 citations92
US6800414B2Oct 5, 2004

Radiation-sensitive resin composition

JSR CORP35 citations92
US6337171B1Jan 8, 2002

Radiation-sensitive resin composition

JSR CORP24 citations92
US6753124B2Jun 22, 2004

Radiation-sensitive resin composition

JSR CORP33 citations91
US7217492B2May 15, 2007

Onium salt compound and radiation-sensitive resin composition

JSR CORP17 citations84
US6800419B2Oct 5, 2004

Radiation-sensitive resin composition

JSR CORP14 citations82
US7087356B2Aug 8, 2006

193nm resist with improved post-exposure properties

JSR CORP17 citations81
US6838225B2Jan 4, 2005

Radiation-sensitive resin composition

JSR CORP7 citations70
US7521169B2Apr 21, 2009

Radiation-sensitive resin composition

JSR CORP4 citations63
US7202016B2Apr 10, 2007

Radiation-sensitive resin composition

JSR CORP4 citations62
US6403288B1Jun 11, 2002

Resist pattern formation method

JSR CORP5 citations62
US11681222B2Jun 20, 2023

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations61
US11036133B2Jun 15, 2021

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations61
US8697344B2Apr 15, 2014

Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern

JSR CORP2 citations60
US8808974B2Aug 19, 2014

Method for forming pattern

JSR CORP2 citations59
US7638261B2Dec 29, 2009

Radiation-sensitive resin composition

JSR CORP0 citations52
US7531286B2May 12, 2009

Radiation-sensitive resin composition

JSR CORP1 citations52
US7452655B2Nov 18, 2008

Acrylic copolymer and radiation-sensitive resin composition

JSR CORP1 citations52
US10620534B2Apr 14, 2020

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51
US10082733B2Sep 25, 2018

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51
US9500950B2Nov 22, 2016

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51
US9213236B2Dec 15, 2015

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

JSR CORP0 citations51

FUJITSU LTD

3 patents
US6961761B2Nov 1, 2005

System and method for partitioning a computer system into domains

FUJITSU LTD53 citations93
US7213081B2May 1, 2007

Dynamic determination of memory mapped input output range granularity for multi-node computer system

FUJITSU LTD40 citations90
US7076576B2Jul 11, 2006

Data transfer in multi-node computer system

FUJITSU LTD3 citations57

IBM

3 patents
US6964840B2Nov 15, 2005

Radiation-sensitive resin composition

IBM28 citations92
US6677419B1Jan 13, 2004

Preparation of copolymers

IBM18 citations84
US7951524B2May 31, 2011

Self-topcoating photoresist for photolithography

IBM3 citations57

NAKAMURA ATSUSHI

2 patents
US8076053B2Dec 13, 2011

Upper layer-forming composition and photoresist patterning method

NAKAMURA ATSUSHI10 citations82
US8435718B2May 7, 2013

Upper layer-forming composition and photoresist patterning method

NAKAMURA ATSUSHI2 citations61

MATSUMURA NOBUJI

2 patents
US8507575B2Aug 13, 2013

Radiation-sensitive resin composition, polymer, and compound

MATSUMURA NOBUJI7 citations67
US8530692B2Sep 10, 2013

Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound

MATSUMURA NOBUJI0 citations36

KIMURA TORU

2 patents
US8247165B2Aug 21, 2012

Upper layer film forming composition for liquid immersion and method of forming photoresist pattern

KIMURA TORU2 citations62
US9182674B2Nov 10, 2015

Immersion upper layer film forming composition and method of forming photoresist pattern

KIMURA TORU1 citations51

NISHITA SATORU

2 patents
US8572428B2Oct 29, 2013

Storage apparatus and control method for storage apparatus

NISHITA SATORU3 citations60
US8307141B2Nov 6, 2012

Multi-core processor, control method thereof, and information processing apparatus

NISHITA SATORU1 citations50

NISHIMURA YUKIO

2 patents
US8124314B2Feb 28, 2012

Radiation-sensitive composition

NISHIMURA YUKIO4 citations57
US8895229B2Nov 25, 2014

Composition for formation of upper layer film, and method for formation of photoresist pattern

NISHIMURA YUKIO1 citations46

KOUNO DAITA

2 patents
US8431332B2Apr 30, 2013

Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern

KOUNO DAITA1 citations45
US8507189B2Aug 13, 2013

Upper layer film forming composition and method of forming photoresist pattern

KOUNO DAITA0 citations35

NAKAGAWA HIROKI

1 patent
US8697343B2Apr 15, 2014

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

NAKAGAWA HIROKI7 citations79

HITACHI LTD

1 patent
US4928185AMay 22, 1990

Rotary head type recording/reproducing method and apparatus for recording and reproducing a digital audio signal

HITACHI LTD9 citations74

AGILENT TECHNOLOGIES INC

1 patent
US6943826B1Sep 13, 2005

Apparatus for debugging imaging devices and method of testing imaging devices

AGILENT TECHNOLOGIES INC6 citations60

SAKAKIBARA HIROKAZU

1 patent
US8697331B2Apr 15, 2014

Compound, polymer, and radiation-sensitive composition

SAKAKIBARA HIROKAZU2 citations59

UNIV TEXAS

1 patent
US7691275B2Apr 6, 2010

Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing

UNIV TEXAS4 citations58

MORI TAKASHI

1 patent
US8791020B2Jul 29, 2014

Silicon-containing film, resin composition, and pattern formation method

MORI TAKASHI1 citations51

HAYAMA TAKAHIRO

1 patent
US9261789B2Feb 16, 2016

Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method

HAYAMA TAKAHIRO1 citations44

JEOL LTD

1 patent
US10302721B2May 28, 2019

Magnetic resonance measurement apparatus with improved instruction sequence transfer

JEOL LTD0 citations35

OTSUKA NOBORU

1 patent
US8802348B2Aug 12, 2014

Radiation-sensitive resin composition

OTSUKA NOBORU0 citations35

Showing the top 50 of 52 patents by PatentIndex Score.