Inventor

HWANG CHAN

KR32 patents

⚠️ This page may combine multiple inventors who share the name “HWANG CHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HWANG CHAN

SAMSUNG ELECTRONICS CO LTD

Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device

Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same

Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system

Overlay correcting method, and photolithography method, semiconductor device manufacturing method and scanner system based on the overlay correcting method

Overlay-correction method and a control system using the same

Methods for measuring overlays

Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device

Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device

EUV exposure apparatus, and overlay correction method and semiconductor device fabricating method using the same

EUV exposure apparatus, and overlay correction method and semiconductor device fabricating method using the same

Semiconductor device

Method of fabricating phase shift mask and method of fabricating semiconductor device

Overlay correcting method, and photolithography method, semiconductor device manufacturing method and scanner system based on the overlay correcting method

Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same

Overlay correction method, and exposure method and semiconductor device manufacturing method including overlay correction method

Method for fabricating semiconductor device

Method of manufacturing integrated circuit device

Optical masks and methods for measuring aberration of a beam

Optical masks and methods for measuring aberration of a beam

Extreme ultraviolet lithography device and method of operating extreme ultraviolet lithography device

Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system

Overlay correction method and semiconductor fabrication method including the same

Gettering members, methods of forming the same, and methods of performing immersion lithography using the same

EUV photomask and method of forming mask pattern using the same

Method of detecting an asymmetric portion of an overlay mark and method of measuring an overlay including the same

Method of manufacturing semiconductor device

Method of fabricating a semiconductor device with an overlay key pattern

Semiconductor device manufacturing system

Methods of determining overlayer reference wavelength

Alignment mark, method of measuring wafer alignment, and method of manufacturing a semiconductor device using the method of measuring wafer alignment

SUPERNOVA INT INC

Fixture for laser engraving long heavy objects

HWANG CHAN

Method of correcting overlay and semiconductor device manufacturing method using the same