Inventor

KOSAKA TAKURO

JP41 patents

⚠️ This page may combine multiple inventors who share the name “KOSAKA TAKURO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOSAKA TAKURO

SHINETSU CHEMICAL CO

Phase shift mask blank, phase shift mask, and blank preparing method

Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method

Photomask blank and method for preparing photomask

Photomask blank, and preparation method thereof

Phase shift mask blank, phase shift mask, and blank preparing method

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank and making method

Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure method

Method for preparing halftone phase shift photomask blank

Halftone phase shift photomask blank and making method

Photomask blank and making method

Reflective mask blank, method of manufacturing thereof, and reflective mask

Phase shift mask blank, manufacturing method thereof, and phase shift mask

Phase shift mask blank, manufacturing method thereof, and phase shift mask

Photomask blank and method for preparing photomask

Phase shift mask blank and phase shift mask

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift mask blank and halftone phase shift mask

Phase shift mask blank, manufacturing method of phase shift mask, and phase shift mask

Phase shift mask blank, method for producing phase shift mask, and phase shift mask

Reflective mask blank, and reflective mask

Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective mask

Reflective mask blank and method for manufacturing reflective mask

Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank

Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank

Method of manufacturing reflective mask blank, and reflective mask blank

Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective mask

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

Halftone phase shift photomask blank and making method

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

Method for preparing halftone phase shift photomask blank

Binary photomask blank, preparation thereof, and preparation of binary photomask

Reflective mask blank, and method for manufacturing reflective mask

Photomask blank, photomask blank making method, and photomask making method

Photomask blank and photomask

Photomask blank, and preparation method thereof

Halftone phase shift-type photomask blank, method of manufacturing thereof, and halftone phase shift-type photomask

SONY SEMICONDUCTOR SOLUTIONS CORP

Imaging device and electronic apparatus

Imaging device and calibration method

Solid state imaging element, imaging apparatus, and method for controlling solid state imaging element