Inventor

TANITSU OSAMU

JP57 patents

⚠️ This page may combine multiple inventors who share the name “TANITSU OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TANITSU OSAMU

NIKON CORP

Optical illumination device, exposure device and exposure method

Optical element, production method of optical element, optical system, and optical apparatus

Illumination optical system, exposure apparatus, and exposure method with polarized switching device

Exposure method, illuminating device, and exposure system

Method and apparatus for illuminating a surface using a projection imaging apparatus

Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and exposure apparatus

Illumination optical apparatus and scanning exposure apparatus

Optical element, production method of optical element, optical system, and optical apparatus

Illumination optical system, an exposure apparatus having the illumination system, and a method for manufacturing a semiconductor device

Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method

Projection optical system, illumination apparatus, and exposure apparatus

Illumination optical system and method of manufacturing semiconductor devices

Illumination optical system to be used in an exposure apparatus and a method of manufacturing a semiconductor structure using the exposure apparatus

Illumination apparatus and projection exposure apparatus using the same

Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment

Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method

Optical reflector, illumination optical system, light source system and illumination optical apparatus

Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method

Exposure apparatus, exposure method, and method for producing device

Illumination apparatus and exposure apparatus

Illumination optical apparatus containing an optical integrator and projection exposure apparatus using the same

Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method

Illumination optical system, exposure apparatus, device production method, and light polarization unit

Exposure apparatus and methods for using the same

Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method

Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method

Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method

Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus, exposure method, and method for producing device

Exposure apparatus, exposure method, and method for producing device

Illumination optical apparatus and semiconductor device manufacturing method

Illumination optical system, exposure apparatus, device production method, and light polarization unit

Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method

Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method

Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method

Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method

TANITSU OSAMU

Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method

Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method

Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method

Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method

Illumination optical system, aligner, and process for fabricating device

Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method

Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method

NIPPON KOGAKU KK

Illumination optical apparatus and scanning exposure apparatus

Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method

OWA SOICHI

Illumination optical apparatus, exposure apparatus, and device manufacturing method

MURAMATSU KOUJI

Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system