Inventor
MATSUURA SEIJI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “MATSUURA SEIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC CORP
7 patentsUS6208469B1Mar 27, 2001
Method of adjusting reduction projection exposure device
NEC CORP25 citations92
US6271919B1Aug 7, 2001
Semiconductor device and alignment apparatus and alignment method for same
NEC CORP14 citations73
US6084678AJul 4, 2000
Method of alignment between mask pattern and wafer pattern
NEC CORP7 citations73
US6013395AJan 11, 2000
Photomask for use in exposure and method for producing same
NEC CORP10 citations73
US6310684B1Oct 30, 2001
Method of measuring spherical aberration in projection system
NEC CORP6 citations62
US6160623ADec 12, 2000
Method for measuring an aberration of a projection optical system
NEC CORP4 citations62
US6335125B2Jan 1, 2002
Photomask and method of manufacturing same
NEC CORP1 citations51