Inventor

BAUM THOMAS H

US255 patents

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BAUM THOMAS H

ADVANCED TECH MATERIALS

Delivery systems for efficient vaporization of precursor source material

Delivery systems for efficient vaporization of precursor source material

Tantalum amide precursors for deposition of tantalum nitride on a substrate

Tantalum amide precursors for deposition of tantalum nitride on a substrate

Growth of BaSrTiO3 using polyamine-based precursors

Antimony and germanium complexes useful for CVD/ALD of metal thin films

Apparatus and process for sensing fluoro species in semiconductor processing systems

Apparatus and process for sensing fluoro species in semiconductor processing systems

Apparatus and process for sensing fluoro species in semiconductor processing systems

Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same

Micro-machined thin film sensor arrays for the detection of H2 containing gases, and method of making and using the same

Compositions and structures for chemical mechanical polishing of FeRAM capacitors and method of fabricating FeRAM capacitors using same

Liquid delivery MOCVD process for deposition of high frequency dielectric materials

Method of forming metal films on a substrate by chemical vapor deposition

Hydrogen sensor utilizing rare earth metal thin film detection element

Metal complex source reagents for chemical vapor deposition

Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising same

Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride

pH buffered compositions useful for cleaning residue from semiconductor substrates

Source reagent composition and method for chemical vapor deposition formation or ZR/HF silicate gate dielectric thin films

Composition and method for low temperature deposition of silicon-containing films

Fluid storage and dispensing system

Polishing slurries for copper and associated materials

Chemical vapor deposition process for fabrication of hybrid electrodes

Method for etch fabrication of iridium-based electrode structures

Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition

Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition

Chemical vapor deposition of high conductivity, adherent thin films of ruthenium

Scalable lead zirconium titanate(PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material

Platinum source compositions for chemical vapor deposition of platinum

Platinum source compositions for chemical vapor deposition of platinum

Chemical mechanical polishing compositions for metal and associated materials and method of using same

Isotropic dry cleaning process for noble metal integrated circuit structures

Method for the selective deposition of bismuth based ferroelectric thin films by chemical vapor deposition

Method for nucleation controlled chemical vapor deposition of metal oxide ferroelectric thin films

Composition and method for low temperature deposition of silicon-containing films

Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same

Tantalum amide complexes for depositing tantalum-containing films, and method of making same

Chemical mechanical planarization pad

Tantalum amide complexes for depositing tantalum-containing films, and method of making same

Supercritical fluid-assisted deposition of materials on semiconductor substrates

Supercritical fluid-assisted deposition of materials on semiconductor substrates

Tantalum amide complexes for depositing tantalum-containing films, and method of making same

IBM

Selective deposition of copper

Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films

ADVANCED TEHNOLOGY MATERIALS I

Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same

LURCOTT STEVEN M

Fluid processing systems and methods

ENTEGRIS INC

Process for preparing organotin compounds