Inventor
FATHAUER PAUL
US17 patents
⚠️ This page may combine multiple inventors who share the name “FATHAUER PAUL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED POWERTRAIN ENG LLC
4 patentsUSD883240SMay 5, 2020
Printed circuit for an automatic transmission solenoid module
ADVANCED POWERTRAIN ENG LLC47 citations96
US9970533B2May 15, 2018
Solenoid rebuilding method for automatic transmissions
ADVANCED POWERTRAIN ENG LLC0 citations50
US9844137B2Dec 12, 2017
Printed circuit assembly for a solenoid module for an automatic transmission
ADVANCED POWERTRAIN ENG LLC0 citations50
US9761986B2Sep 12, 2017
Retaining clip for electrical connectors
ADVANCED POWERTRAIN ENG LLC1 citations50
RAYTECH INNOVATIVE SOLUTIONS L
4 patentsUS6945846B1Sep 20, 2005
Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making
RAYTECH INNOVATIVE SOLUTIONS L18 citations89
US7025668B2Apr 11, 2006
Gradient polishing pad made from paper-making fibers for use in chemical/mechanical planarization of wafers
RAYTECH INNOVATIVE SOLUTIONS L10 citations71
US6979256B2Dec 27, 2005
Retaining ring with wear pad for use in chemical mechanical planarization
RAYTECH INNOVATIVE SOLUTIONS L4 citations59
US6964601B2Nov 15, 2005
Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafers
RAYTECH INNOVATIVE SOLUTIONS L0 citations47
RAYTECH INNOVATIVE SOLUTIONS I
4 patentsUS6899610B2May 31, 2005
Retaining ring with wear pad for use in chemical mechanical planarization
RAYTECH INNOVATIVE SOLUTIONS I19 citations89
US6875077B2Apr 5, 2005
Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making
RAYTECH INNOVATIVE SOLUTIONS I30 citations89
US6852020B2Feb 8, 2005
Polishing pad for use in chemical—mechanical planarization of semiconductor wafers and method of making same
RAYTECH INNOVATIVE SOLUTIONS I38 citations89
US6863774B2Mar 8, 2005
Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same
RAYTECH INNOVATIVE SOLUTIONS I5 citations59